Linking the Results of CIPM and RMO Key Comparisons With Linear Trends

A statistical approach to link the results of interlaboratory comparisons with linear trends is proposed. This approach can be applied to the case that the comparison artifacts have the same nominal values or the measured quantities have the same magnitudes. The degrees of equivalence between the pa...

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Detalles Bibliográficos
Autor principal: Zhang, Nien Fan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 2010
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4548531/
https://www.ncbi.nlm.nih.gov/pubmed/27134784
http://dx.doi.org/10.6028/jres.115.010
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author Zhang, Nien Fan
author_facet Zhang, Nien Fan
author_sort Zhang, Nien Fan
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description A statistical approach to link the results of interlaboratory comparisons with linear trends is proposed. This approach can be applied to the case that the comparison artifacts have the same nominal values or the measured quantities have the same magnitudes. The degrees of equivalence between the pairs of National Metrology Institutes that have not participated in the same comparisons, and their corresponding uncertainties are established. The approach is applied to link the CCEM-K2 and SIM.EM-K2 comparisons for resistance at 1 G Ω level.
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spelling pubmed-45485312016-04-29 Linking the Results of CIPM and RMO Key Comparisons With Linear Trends Zhang, Nien Fan J Res Natl Inst Stand Technol Article A statistical approach to link the results of interlaboratory comparisons with linear trends is proposed. This approach can be applied to the case that the comparison artifacts have the same nominal values or the measured quantities have the same magnitudes. The degrees of equivalence between the pairs of National Metrology Institutes that have not participated in the same comparisons, and their corresponding uncertainties are established. The approach is applied to link the CCEM-K2 and SIM.EM-K2 comparisons for resistance at 1 G Ω level. [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 2010 2010-06-01 /pmc/articles/PMC4548531/ /pubmed/27134784 http://dx.doi.org/10.6028/jres.115.010 Text en https://creativecommons.org/publicdomain/zero/1.0/ The Journal of Research of the National Institute of Standards and Technology is a publication of the U.S. Government. The papers are in the public domain and are not subject to copyright in the United States. Articles from J Res may contain photographs or illustrations copyrighted by other commercial organizations or individuals that may not be used without obtaining prior approval from the holder of the copyright.
spellingShingle Article
Zhang, Nien Fan
Linking the Results of CIPM and RMO Key Comparisons With Linear Trends
title Linking the Results of CIPM and RMO Key Comparisons With Linear Trends
title_full Linking the Results of CIPM and RMO Key Comparisons With Linear Trends
title_fullStr Linking the Results of CIPM and RMO Key Comparisons With Linear Trends
title_full_unstemmed Linking the Results of CIPM and RMO Key Comparisons With Linear Trends
title_short Linking the Results of CIPM and RMO Key Comparisons With Linear Trends
title_sort linking the results of cipm and rmo key comparisons with linear trends
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4548531/
https://www.ncbi.nlm.nih.gov/pubmed/27134784
http://dx.doi.org/10.6028/jres.115.010
work_keys_str_mv AT zhangnienfan linkingtheresultsofcipmandrmokeycomparisonswithlineartrends

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