Cargando…
Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications
In many areas of science and technology, patterned films and surfaces play a key role in engineering and development of advanced materials. Here, we present a versatile toolbox that provides an easy patterning method for cellulose thin films by means of photolithography and enzymatic digestion. A pa...
Autores principales: | Wolfberger, Archim, Petritz, Andreas, Fian, Alexander, Herka, Jakob, Schmidt, Volker, Stadlober, Barbara, Kargl, Rupert, Spirk, Stefan, Griesser, Thomas |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer Netherlands
2014
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4579862/ https://www.ncbi.nlm.nih.gov/pubmed/26412951 http://dx.doi.org/10.1007/s10570-014-0471-4 |
Ejemplares similares
-
Photoregeneration of Trimethylsilyl Cellulose as a Tool for Microstructuring Ultrathin Cellulose Supports
por: Wolfberger, Archim, et al.
Publicado: (2014) -
High performance p-type organic thin film transistors with an intrinsically photopatternable, ultrathin polymer dielectric layer()
por: Petritz, Andreas, et al.
Publicado: (2013) -
Epoxy Resins for Negative Tone Photoresists
por: Vlnieska, Vitor, et al.
Publicado: (2019) -
Electrical in-situ characterisation of interface stabilised organic thin-film transistors
por: Striedinger, Bernd, et al.
Publicado: (2015) -
Lithographic Performance of Aryl Epoxy Thermoset Resins as Negative Tone Photoresist for Microlithography
por: Vlnieska, Vitor, et al.
Publicado: (2020)