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Vacancy and Doping States in Monolayer and bulk Black Phosphorus

The atomic geometries and transition levels of point defects and substitutional dopants in few-layer and bulk black phosphorus are calculated. The vacancy is found to reconstruct in monolayer P to leave a single dangling bond, giving a negative U defect with a +/− transition level at 0.24 eV above t...

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Autores principales: Guo, Yuzheng, Robertson, John
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2015
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4585662/
https://www.ncbi.nlm.nih.gov/pubmed/26383634
http://dx.doi.org/10.1038/srep14165
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author Guo, Yuzheng
Robertson, John
author_facet Guo, Yuzheng
Robertson, John
author_sort Guo, Yuzheng
collection PubMed
description The atomic geometries and transition levels of point defects and substitutional dopants in few-layer and bulk black phosphorus are calculated. The vacancy is found to reconstruct in monolayer P to leave a single dangling bond, giving a negative U defect with a +/− transition level at 0.24 eV above the valence band edge. The V(−) state forms an unusual 4-fold coordinated site. In few-layer and bulk black P, the defect becomes a positive U site. The divacancy is much more stable than the monovacancy, and it reconstructs to give no deep gap states. Substitutional dopants such as C, Si, O or S do not give rise to shallow donor or acceptor states but instead reconstruct to form non-doping sites analogous to DX or AX centers in GaAs. Impurities on black P adopt the 8-N rule of bonding, as in amorphous semiconductors, rather than simple substitutional geometries seen in tetrahedral semiconductors.
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spelling pubmed-45856622015-09-29 Vacancy and Doping States in Monolayer and bulk Black Phosphorus Guo, Yuzheng Robertson, John Sci Rep Article The atomic geometries and transition levels of point defects and substitutional dopants in few-layer and bulk black phosphorus are calculated. The vacancy is found to reconstruct in monolayer P to leave a single dangling bond, giving a negative U defect with a +/− transition level at 0.24 eV above the valence band edge. The V(−) state forms an unusual 4-fold coordinated site. In few-layer and bulk black P, the defect becomes a positive U site. The divacancy is much more stable than the monovacancy, and it reconstructs to give no deep gap states. Substitutional dopants such as C, Si, O or S do not give rise to shallow donor or acceptor states but instead reconstruct to form non-doping sites analogous to DX or AX centers in GaAs. Impurities on black P adopt the 8-N rule of bonding, as in amorphous semiconductors, rather than simple substitutional geometries seen in tetrahedral semiconductors. Nature Publishing Group 2015-09-18 /pmc/articles/PMC4585662/ /pubmed/26383634 http://dx.doi.org/10.1038/srep14165 Text en Copyright © 2015, Macmillan Publishers Limited http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
spellingShingle Article
Guo, Yuzheng
Robertson, John
Vacancy and Doping States in Monolayer and bulk Black Phosphorus
title Vacancy and Doping States in Monolayer and bulk Black Phosphorus
title_full Vacancy and Doping States in Monolayer and bulk Black Phosphorus
title_fullStr Vacancy and Doping States in Monolayer and bulk Black Phosphorus
title_full_unstemmed Vacancy and Doping States in Monolayer and bulk Black Phosphorus
title_short Vacancy and Doping States in Monolayer and bulk Black Phosphorus
title_sort vacancy and doping states in monolayer and bulk black phosphorus
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4585662/
https://www.ncbi.nlm.nih.gov/pubmed/26383634
http://dx.doi.org/10.1038/srep14165
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