Fabrication of 3-nm-thick Si(3)N(4) membranes for solid-state nanopores using the poly-Si sacrificial layer process

To improve the spatial resolution of solid-state nanopores, thinning the membrane is a very important issue. The most commonly used membrane material for solid-state nanopores is silicon nitride (Si(3)N(4)). However, until now, stable wafer-scale fabrication of Si(3)N(4) membranes with a thickness o...

Descripción completa

Detalles Bibliográficos
Autores principales: Yanagi, Itaru, Ishida, Takeshi, Fujisaki, Koji, Takeda, Ken-ichi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2015
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4589763/
https://www.ncbi.nlm.nih.gov/pubmed/26424588
http://dx.doi.org/10.1038/srep14656

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4589763/
https://www.ncbi.nlm.nih.gov/pubmed/26424588
http://dx.doi.org/10.1038/srep14656

Ejemplares similares