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Fabrication of 3-nm-thick Si(3)N(4) membranes for solid-state nanopores using the poly-Si sacrificial layer process
To improve the spatial resolution of solid-state nanopores, thinning the membrane is a very important issue. The most commonly used membrane material for solid-state nanopores is silicon nitride (Si(3)N(4)). However, until now, stable wafer-scale fabrication of Si(3)N(4) membranes with a thickness o...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group
2015
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4589763/ https://www.ncbi.nlm.nih.gov/pubmed/26424588 http://dx.doi.org/10.1038/srep14656 |