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Interface control by homoepitaxial growth in pulsed laser deposited iron chalcogenide thin films
Thin film growth of iron chalcogenides by pulsed laser deposition (PLD) is still a delicate issue in terms of simultaneous control of stoichiometry, texture, substrate/film interface properties, and superconducting properties. The high volatility of the constituents sharply limits optimal deposition...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2015
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4637838/ https://www.ncbi.nlm.nih.gov/pubmed/26548645 http://dx.doi.org/10.1038/srep16334 |
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author | Molatta, Sebastian Haindl, Silvia Trommler, Sascha Schulze, Michael Wurmehl, Sabine Hühne, Ruben |
author_facet | Molatta, Sebastian Haindl, Silvia Trommler, Sascha Schulze, Michael Wurmehl, Sabine Hühne, Ruben |
author_sort | Molatta, Sebastian |
collection | PubMed |
description | Thin film growth of iron chalcogenides by pulsed laser deposition (PLD) is still a delicate issue in terms of simultaneous control of stoichiometry, texture, substrate/film interface properties, and superconducting properties. The high volatility of the constituents sharply limits optimal deposition temperatures to a narrow window and mainly challenges reproducibility for vacuum based methods. In this work we demonstrate the beneficial introduction of a semiconducting FeSe(1−x)Te(x) seed layer for subsequent homoepitaxial growth of superconducting FeSe(1−x)Te(x) thin film on MgO substrates. MgO is one of the most favorable substrates used in superconducting thin film applications, but the controlled growth of iron chalcogenide thin films on MgO has not yet been optimized and is the least understood. The large mismatch between the lattice constants of MgO and FeSe(1−x)Te(x) of about 11% results in thin films with a mixed texture, that prevents further accurate investigations of a correlation between structural and electrical properties of FeSe(1−x)Te(x). Here we present an effective way to significantly improve epitaxial growth of superconducting FeSe(1−x)Te(x) thin films with reproducible high critical temperatures (≥17 K) at reduced deposition temperatures (200 °C–320 °C) on MgO using PLD. This offers a broad scope of various applications. |
format | Online Article Text |
id | pubmed-4637838 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2015 |
publisher | Nature Publishing Group |
record_format | MEDLINE/PubMed |
spelling | pubmed-46378382015-11-30 Interface control by homoepitaxial growth in pulsed laser deposited iron chalcogenide thin films Molatta, Sebastian Haindl, Silvia Trommler, Sascha Schulze, Michael Wurmehl, Sabine Hühne, Ruben Sci Rep Article Thin film growth of iron chalcogenides by pulsed laser deposition (PLD) is still a delicate issue in terms of simultaneous control of stoichiometry, texture, substrate/film interface properties, and superconducting properties. The high volatility of the constituents sharply limits optimal deposition temperatures to a narrow window and mainly challenges reproducibility for vacuum based methods. In this work we demonstrate the beneficial introduction of a semiconducting FeSe(1−x)Te(x) seed layer for subsequent homoepitaxial growth of superconducting FeSe(1−x)Te(x) thin film on MgO substrates. MgO is one of the most favorable substrates used in superconducting thin film applications, but the controlled growth of iron chalcogenide thin films on MgO has not yet been optimized and is the least understood. The large mismatch between the lattice constants of MgO and FeSe(1−x)Te(x) of about 11% results in thin films with a mixed texture, that prevents further accurate investigations of a correlation between structural and electrical properties of FeSe(1−x)Te(x). Here we present an effective way to significantly improve epitaxial growth of superconducting FeSe(1−x)Te(x) thin films with reproducible high critical temperatures (≥17 K) at reduced deposition temperatures (200 °C–320 °C) on MgO using PLD. This offers a broad scope of various applications. Nature Publishing Group 2015-11-09 /pmc/articles/PMC4637838/ /pubmed/26548645 http://dx.doi.org/10.1038/srep16334 Text en Copyright © 2015, Macmillan Publishers Limited http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ |
spellingShingle | Article Molatta, Sebastian Haindl, Silvia Trommler, Sascha Schulze, Michael Wurmehl, Sabine Hühne, Ruben Interface control by homoepitaxial growth in pulsed laser deposited iron chalcogenide thin films |
title | Interface control by homoepitaxial growth in pulsed laser deposited iron chalcogenide thin films |
title_full | Interface control by homoepitaxial growth in pulsed laser deposited iron chalcogenide thin films |
title_fullStr | Interface control by homoepitaxial growth in pulsed laser deposited iron chalcogenide thin films |
title_full_unstemmed | Interface control by homoepitaxial growth in pulsed laser deposited iron chalcogenide thin films |
title_short | Interface control by homoepitaxial growth in pulsed laser deposited iron chalcogenide thin films |
title_sort | interface control by homoepitaxial growth in pulsed laser deposited iron chalcogenide thin films |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4637838/ https://www.ncbi.nlm.nih.gov/pubmed/26548645 http://dx.doi.org/10.1038/srep16334 |
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