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Corrigendum: Crystallinity of tellurium capping and epitaxy of ferromagnetic topological insulator films on SrTiO(3)

Detalles Bibliográficos
Autores principales:	Park, Jihwey, Soh, Yeong-Ah, Aeppli, Gabriel, Feng, Xiao, Ou, Yunbo, He, Ke, Xue, Qi-Kun
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Nature Publishing Group 2015
Materias:	Corrigenda
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4642700/ https://www.ncbi.nlm.nih.gov/pubmed/26412022 http://dx.doi.org/10.1038/srep14147

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