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A Summary of Lightpipe Radiation Thermometry Research at NIST
During the last 10 years, research in light-pipe radiation thermometry has significantly reduced the uncertainties for temperature measurements in semiconductor processing. The National Institute of Standards and Technology (NIST) has improved the calibration of lightpipe radiation thermometers (LPR...
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Formato: | Online Artículo Texto |
Lenguaje: | English |
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[Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology
2006
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Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4654607/ https://www.ncbi.nlm.nih.gov/pubmed/27274914 http://dx.doi.org/10.6028/jres.111.002 |
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author | Tsai, Benjamin K. |
author_facet | Tsai, Benjamin K. |
author_sort | Tsai, Benjamin K. |
collection | PubMed |
description | During the last 10 years, research in light-pipe radiation thermometry has significantly reduced the uncertainties for temperature measurements in semiconductor processing. The National Institute of Standards and Technology (NIST) has improved the calibration of lightpipe radiation thermometers (LPRTs), the characterization procedures for LPRTs, the in situ calibration of LPRTs using thin-film thermocouple (TFTC) test wafers, and the application of model-based corrections to improve LPRT spectral radiance temperatures. Collaboration with industry on implementing techniques and ideas established at NIST has led to improvements in temperature measurements in semiconductor processing. LPRTs have been successfully calibrated at NIST for rapid thermal processing (RTP) applications using a sodium heat-pipe blackbody between 700 °C and 900 °C with an uncertainty of about 0.3 °C (k = 1) traceable to the International Temperature Scale of 1990. Employing appropriate effective emissivity models, LPRTs have been used to determine the wafer temperature in the NIST RTP Test Bed with an uncertainty of 3.5 °C. Using a TFTC wafer for calibration, the LPRT can measure the wafer temperature in the NIST RTP Test Bed with an uncertainty of 2.3 °C. Collaborations with industry in characterizing and calibrating LPRTs will be summarized, and future directions for LPRT research will be discussed. |
format | Online Article Text |
id | pubmed-4654607 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2006 |
publisher | [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology |
record_format | MEDLINE/PubMed |
spelling | pubmed-46546072016-06-03 A Summary of Lightpipe Radiation Thermometry Research at NIST Tsai, Benjamin K. J Res Natl Inst Stand Technol Article During the last 10 years, research in light-pipe radiation thermometry has significantly reduced the uncertainties for temperature measurements in semiconductor processing. The National Institute of Standards and Technology (NIST) has improved the calibration of lightpipe radiation thermometers (LPRTs), the characterization procedures for LPRTs, the in situ calibration of LPRTs using thin-film thermocouple (TFTC) test wafers, and the application of model-based corrections to improve LPRT spectral radiance temperatures. Collaboration with industry on implementing techniques and ideas established at NIST has led to improvements in temperature measurements in semiconductor processing. LPRTs have been successfully calibrated at NIST for rapid thermal processing (RTP) applications using a sodium heat-pipe blackbody between 700 °C and 900 °C with an uncertainty of about 0.3 °C (k = 1) traceable to the International Temperature Scale of 1990. Employing appropriate effective emissivity models, LPRTs have been used to determine the wafer temperature in the NIST RTP Test Bed with an uncertainty of 3.5 °C. Using a TFTC wafer for calibration, the LPRT can measure the wafer temperature in the NIST RTP Test Bed with an uncertainty of 2.3 °C. Collaborations with industry in characterizing and calibrating LPRTs will be summarized, and future directions for LPRT research will be discussed. [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 2006 2006-02-01 /pmc/articles/PMC4654607/ /pubmed/27274914 http://dx.doi.org/10.6028/jres.111.002 Text en https://creativecommons.org/publicdomain/zero/1.0/ The Journal of Research of the National Institute of Standards and Technology is a publication of the U.S. Government. The papers are in the public domain and are not subject to copyright in the United States. Articles from J Res may contain photographs or illustrations copyrighted by other commercial organizations or individuals that may not be used without obtaining prior approval from the holder of the copyright. |
spellingShingle | Article Tsai, Benjamin K. A Summary of Lightpipe Radiation Thermometry Research at NIST |
title | A Summary of Lightpipe Radiation Thermometry Research at NIST |
title_full | A Summary of Lightpipe Radiation Thermometry Research at NIST |
title_fullStr | A Summary of Lightpipe Radiation Thermometry Research at NIST |
title_full_unstemmed | A Summary of Lightpipe Radiation Thermometry Research at NIST |
title_short | A Summary of Lightpipe Radiation Thermometry Research at NIST |
title_sort | summary of lightpipe radiation thermometry research at nist |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4654607/ https://www.ncbi.nlm.nih.gov/pubmed/27274914 http://dx.doi.org/10.6028/jres.111.002 |
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