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Patterning two-dimensional free-standing surfaces with mesoporous conducting polymers

The ability to pattern functional moieties with well-defined architectures is highly important in material science, nanotechnology and bioengineering. Although two-dimensional surfaces can serve as attractive platforms, direct patterning them in solution with regular arrays remains a major challenge...

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Detalles Bibliográficos
Autores principales: Liu, Shaohua, Gordiichuk, Pavlo, Wu, Zhong-Shuai, Liu, Zhaoyang, Wei, Wei, Wagner, Manfred, Mohamed-Noriega, Nasser, Wu, Dongqing, Mai, Yiyong, Herrmann, Andreas, Müllen, Klaus, Feng, Xinliang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Pub. Group 2015
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4660032/
https://www.ncbi.nlm.nih.gov/pubmed/26577914
http://dx.doi.org/10.1038/ncomms9817
Descripción
Sumario:The ability to pattern functional moieties with well-defined architectures is highly important in material science, nanotechnology and bioengineering. Although two-dimensional surfaces can serve as attractive platforms, direct patterning them in solution with regular arrays remains a major challenge. Here we develop a versatile route to pattern two-dimensional free-standing surfaces in a controlled manner assisted by monomicelle close-packing assembly of block copolymers, which is unambiguously revealed by direct visual observation. This strategy allows for bottom-up patterning of polypyrrole and polyaniline with adjustable mesopores on various functional free-standing surfaces, including two-dimensional graphene, molybdenum sulfide, titania nanosheets and even on one-dimensional carbon nanotubes. As exemplified by graphene oxide-based mesoporous polypyrrole nanosheets, the unique sandwich structure with adjustable pore sizes (5–20 nm) and thickness (35–45 nm) as well as enlarged specific surface area (85 m(2) g(−1)) provides excellent specific capacitance and rate performance for supercapacitors. Therefore, this approach will shed light on developing solution-based soft patterning of given interfaces towards bespoke functions.