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Kelvin probe force microscopy for local characterisation of active nanoelectronic devices

Frequency modulated Kelvin probe force microscopy (FM-KFM) is the method of choice for high resolution measurements of local surface potentials, yet on coarse topographic structures most researchers revert to amplitude modulated lift-mode techniques for better stability. This approach inevitably tra...

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Autores principales: Wagner, Tino, Beyer, Hannes, Reissner, Patrick, Mensch, Philipp, Riel, Heike, Gotsmann, Bernd, Stemmer, Andreas
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2015
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4685916/
https://www.ncbi.nlm.nih.gov/pubmed/26734511
http://dx.doi.org/10.3762/bjnano.6.225
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author Wagner, Tino
Beyer, Hannes
Reissner, Patrick
Mensch, Philipp
Riel, Heike
Gotsmann, Bernd
Stemmer, Andreas
author_facet Wagner, Tino
Beyer, Hannes
Reissner, Patrick
Mensch, Philipp
Riel, Heike
Gotsmann, Bernd
Stemmer, Andreas
author_sort Wagner, Tino
collection PubMed
description Frequency modulated Kelvin probe force microscopy (FM-KFM) is the method of choice for high resolution measurements of local surface potentials, yet on coarse topographic structures most researchers revert to amplitude modulated lift-mode techniques for better stability. This approach inevitably translates into lower lateral resolution and pronounced capacitive averaging of the locally measured contact potential difference. Furthermore, local changes in the strength of the electrostatic interaction between tip and surface easily lead to topography crosstalk seen in the surface potential. To take full advantage of the superior resolution of FM-KFM while maintaining robust topography feedback and minimal crosstalk, we introduce a novel FM-KFM controller based on a Kalman filter and direct demodulation of sidebands. We discuss the origin of sidebands in FM-KFM irrespective of the cantilever quality factor and how direct sideband demodulation enables robust amplitude modulated topography feedback. Finally, we demonstrate our single-scan FM-KFM technique on an active nanoelectronic device consisting of a 70 nm diameter InAs nanowire contacted by a pair of 120 nm thick electrodes.
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spelling pubmed-46859162016-01-05 Kelvin probe force microscopy for local characterisation of active nanoelectronic devices Wagner, Tino Beyer, Hannes Reissner, Patrick Mensch, Philipp Riel, Heike Gotsmann, Bernd Stemmer, Andreas Beilstein J Nanotechnol Full Research Paper Frequency modulated Kelvin probe force microscopy (FM-KFM) is the method of choice for high resolution measurements of local surface potentials, yet on coarse topographic structures most researchers revert to amplitude modulated lift-mode techniques for better stability. This approach inevitably translates into lower lateral resolution and pronounced capacitive averaging of the locally measured contact potential difference. Furthermore, local changes in the strength of the electrostatic interaction between tip and surface easily lead to topography crosstalk seen in the surface potential. To take full advantage of the superior resolution of FM-KFM while maintaining robust topography feedback and minimal crosstalk, we introduce a novel FM-KFM controller based on a Kalman filter and direct demodulation of sidebands. We discuss the origin of sidebands in FM-KFM irrespective of the cantilever quality factor and how direct sideband demodulation enables robust amplitude modulated topography feedback. Finally, we demonstrate our single-scan FM-KFM technique on an active nanoelectronic device consisting of a 70 nm diameter InAs nanowire contacted by a pair of 120 nm thick electrodes. Beilstein-Institut 2015-11-23 /pmc/articles/PMC4685916/ /pubmed/26734511 http://dx.doi.org/10.3762/bjnano.6.225 Text en Copyright © 2015, Wagner et al. https://creativecommons.org/licenses/by/2.0https://www.beilstein-journals.org/bjnano/termsThis is an Open Access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (https://www.beilstein-journals.org/bjnano/terms)
spellingShingle Full Research Paper
Wagner, Tino
Beyer, Hannes
Reissner, Patrick
Mensch, Philipp
Riel, Heike
Gotsmann, Bernd
Stemmer, Andreas
Kelvin probe force microscopy for local characterisation of active nanoelectronic devices
title Kelvin probe force microscopy for local characterisation of active nanoelectronic devices
title_full Kelvin probe force microscopy for local characterisation of active nanoelectronic devices
title_fullStr Kelvin probe force microscopy for local characterisation of active nanoelectronic devices
title_full_unstemmed Kelvin probe force microscopy for local characterisation of active nanoelectronic devices
title_short Kelvin probe force microscopy for local characterisation of active nanoelectronic devices
title_sort kelvin probe force microscopy for local characterisation of active nanoelectronic devices
topic Full Research Paper
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4685916/
https://www.ncbi.nlm.nih.gov/pubmed/26734511
http://dx.doi.org/10.3762/bjnano.6.225
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