Cargando…
Time Invariant Surface Roughness Evolution during Atmospheric Pressure Thin Film Depositions
The evolution of thin film morphology during atmospheric pressure deposition has been studied utilizing Monte Carlo methods. Time invariant root-mean-squared roughness and local roughness morphology were both observed when employing a novel simulation parameter, modeling the effect of the experiment...
Autores principales: | Merkh, Thomas, Spivey, Robert, Lu, Toh Ming |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2016
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4728611/ https://www.ncbi.nlm.nih.gov/pubmed/26814165 http://dx.doi.org/10.1038/srep19888 |
Ejemplares similares
-
Influence of Surface Roughness on the Dynamics and
Crystallization of Vapor-Deposited Thin Films
por: Beena Unni, Aparna, et al.
Publicado: (2022) -
Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition
por: Narimisa, Mehrnoush, et al.
Publicado: (2020) -
Atomistic Insights into Aluminum Doping Effect on Surface Roughness of Deposited Ultra-Thin Silver Films
por: Tian, Zhong, et al.
Publicado: (2021) -
Antibacterial Thin Films Deposited from Propane–Butane Mixture in Atmospheric Pressure Discharge
por: Sťahel, Pavel, et al.
Publicado: (2023) -
Insights into the Role of Plasma in Atmospheric Pressure Chemical Vapor Deposition of Titanium Dioxide Thin Films
por: Kang, Seongchan, et al.
Publicado: (2018)