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The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi(2)O(3) co-doped LiNbO(3) crystals
For a long time that optical damage was renamed as photorefraction, here we find that the optical damage resistance and photorefraction can be simultaneously enhanced in MgO and Bi(2)O(3) co-doped LiNbO(3) (LN:Bi,Mg). The photorefractive response time of LN:Bi,Mg was shortened to 170 ms while the ph...
Autores principales: | , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2016
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4738261/ https://www.ncbi.nlm.nih.gov/pubmed/26837261 http://dx.doi.org/10.1038/srep20308 |
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author | Zheng, Dahuai Kong, Yongfa Liu, Shiguo Chen, Muling Chen, Shaolin Zhang, Ling Rupp, Romano Xu, Jingjun |
author_facet | Zheng, Dahuai Kong, Yongfa Liu, Shiguo Chen, Muling Chen, Shaolin Zhang, Ling Rupp, Romano Xu, Jingjun |
author_sort | Zheng, Dahuai |
collection | PubMed |
description | For a long time that optical damage was renamed as photorefraction, here we find that the optical damage resistance and photorefraction can be simultaneously enhanced in MgO and Bi(2)O(3) co-doped LiNbO(3) (LN:Bi,Mg). The photorefractive response time of LN:Bi,Mg was shortened to 170 ms while the photorefractive sensitivity reached up to 21 cm(2)/J. Meanwhile, LN:Bi,Mg crystals could withstand a light intensity higher than 10(6) W/cm(2) without apparent optical damage. Our experimental results indicate that photorefraction doesn’t equal to optical damage. The underground mechanism was analyzed and attributed to that diffusion dominates the transport process of charge carriers, that is to say photorefraction causes only slight optical damage under diffusion mechanism, which is very important for the practical applications of photorefractive crystals, such as in holographic storage, integrated optics and 3D display. |
format | Online Article Text |
id | pubmed-4738261 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2016 |
publisher | Nature Publishing Group |
record_format | MEDLINE/PubMed |
spelling | pubmed-47382612016-02-09 The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi(2)O(3) co-doped LiNbO(3) crystals Zheng, Dahuai Kong, Yongfa Liu, Shiguo Chen, Muling Chen, Shaolin Zhang, Ling Rupp, Romano Xu, Jingjun Sci Rep Article For a long time that optical damage was renamed as photorefraction, here we find that the optical damage resistance and photorefraction can be simultaneously enhanced in MgO and Bi(2)O(3) co-doped LiNbO(3) (LN:Bi,Mg). The photorefractive response time of LN:Bi,Mg was shortened to 170 ms while the photorefractive sensitivity reached up to 21 cm(2)/J. Meanwhile, LN:Bi,Mg crystals could withstand a light intensity higher than 10(6) W/cm(2) without apparent optical damage. Our experimental results indicate that photorefraction doesn’t equal to optical damage. The underground mechanism was analyzed and attributed to that diffusion dominates the transport process of charge carriers, that is to say photorefraction causes only slight optical damage under diffusion mechanism, which is very important for the practical applications of photorefractive crystals, such as in holographic storage, integrated optics and 3D display. Nature Publishing Group 2016-02-03 /pmc/articles/PMC4738261/ /pubmed/26837261 http://dx.doi.org/10.1038/srep20308 Text en Copyright © 2016, Macmillan Publishers Limited http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ |
spellingShingle | Article Zheng, Dahuai Kong, Yongfa Liu, Shiguo Chen, Muling Chen, Shaolin Zhang, Ling Rupp, Romano Xu, Jingjun The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi(2)O(3) co-doped LiNbO(3) crystals |
title | The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi(2)O(3) co-doped LiNbO(3) crystals |
title_full | The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi(2)O(3) co-doped LiNbO(3) crystals |
title_fullStr | The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi(2)O(3) co-doped LiNbO(3) crystals |
title_full_unstemmed | The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi(2)O(3) co-doped LiNbO(3) crystals |
title_short | The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi(2)O(3) co-doped LiNbO(3) crystals |
title_sort | simultaneous enhancement of photorefraction and optical damage resistance in mgo and bi(2)o(3) co-doped linbo(3) crystals |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4738261/ https://www.ncbi.nlm.nih.gov/pubmed/26837261 http://dx.doi.org/10.1038/srep20308 |
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