Cargando…

The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi(2)O(3) co-doped LiNbO(3) crystals

For a long time that optical damage was renamed as photorefraction, here we find that the optical damage resistance and photorefraction can be simultaneously enhanced in MgO and Bi(2)O(3) co-doped LiNbO(3) (LN:Bi,Mg). The photorefractive response time of LN:Bi,Mg was shortened to 170 ms while the ph...

Descripción completa

Detalles Bibliográficos
Autores principales: Zheng, Dahuai, Kong, Yongfa, Liu, Shiguo, Chen, Muling, Chen, Shaolin, Zhang, Ling, Rupp, Romano, Xu, Jingjun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4738261/
https://www.ncbi.nlm.nih.gov/pubmed/26837261
http://dx.doi.org/10.1038/srep20308
_version_ 1782413576062894080
author Zheng, Dahuai
Kong, Yongfa
Liu, Shiguo
Chen, Muling
Chen, Shaolin
Zhang, Ling
Rupp, Romano
Xu, Jingjun
author_facet Zheng, Dahuai
Kong, Yongfa
Liu, Shiguo
Chen, Muling
Chen, Shaolin
Zhang, Ling
Rupp, Romano
Xu, Jingjun
author_sort Zheng, Dahuai
collection PubMed
description For a long time that optical damage was renamed as photorefraction, here we find that the optical damage resistance and photorefraction can be simultaneously enhanced in MgO and Bi(2)O(3) co-doped LiNbO(3) (LN:Bi,Mg). The photorefractive response time of LN:Bi,Mg was shortened to 170 ms while the photorefractive sensitivity reached up to 21 cm(2)/J. Meanwhile, LN:Bi,Mg crystals could withstand a light intensity higher than 10(6)  W/cm(2) without apparent optical damage. Our experimental results indicate that photorefraction doesn’t equal to optical damage. The underground mechanism was analyzed and attributed to that diffusion dominates the transport process of charge carriers, that is to say photorefraction causes only slight optical damage under diffusion mechanism, which is very important for the practical applications of photorefractive crystals, such as in holographic storage, integrated optics and 3D display.
format Online
Article
Text
id pubmed-4738261
institution National Center for Biotechnology Information
language English
publishDate 2016
publisher Nature Publishing Group
record_format MEDLINE/PubMed
spelling pubmed-47382612016-02-09 The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi(2)O(3) co-doped LiNbO(3) crystals Zheng, Dahuai Kong, Yongfa Liu, Shiguo Chen, Muling Chen, Shaolin Zhang, Ling Rupp, Romano Xu, Jingjun Sci Rep Article For a long time that optical damage was renamed as photorefraction, here we find that the optical damage resistance and photorefraction can be simultaneously enhanced in MgO and Bi(2)O(3) co-doped LiNbO(3) (LN:Bi,Mg). The photorefractive response time of LN:Bi,Mg was shortened to 170 ms while the photorefractive sensitivity reached up to 21 cm(2)/J. Meanwhile, LN:Bi,Mg crystals could withstand a light intensity higher than 10(6)  W/cm(2) without apparent optical damage. Our experimental results indicate that photorefraction doesn’t equal to optical damage. The underground mechanism was analyzed and attributed to that diffusion dominates the transport process of charge carriers, that is to say photorefraction causes only slight optical damage under diffusion mechanism, which is very important for the practical applications of photorefractive crystals, such as in holographic storage, integrated optics and 3D display. Nature Publishing Group 2016-02-03 /pmc/articles/PMC4738261/ /pubmed/26837261 http://dx.doi.org/10.1038/srep20308 Text en Copyright © 2016, Macmillan Publishers Limited http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
spellingShingle Article
Zheng, Dahuai
Kong, Yongfa
Liu, Shiguo
Chen, Muling
Chen, Shaolin
Zhang, Ling
Rupp, Romano
Xu, Jingjun
The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi(2)O(3) co-doped LiNbO(3) crystals
title The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi(2)O(3) co-doped LiNbO(3) crystals
title_full The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi(2)O(3) co-doped LiNbO(3) crystals
title_fullStr The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi(2)O(3) co-doped LiNbO(3) crystals
title_full_unstemmed The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi(2)O(3) co-doped LiNbO(3) crystals
title_short The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi(2)O(3) co-doped LiNbO(3) crystals
title_sort simultaneous enhancement of photorefraction and optical damage resistance in mgo and bi(2)o(3) co-doped linbo(3) crystals
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4738261/
https://www.ncbi.nlm.nih.gov/pubmed/26837261
http://dx.doi.org/10.1038/srep20308
work_keys_str_mv AT zhengdahuai thesimultaneousenhancementofphotorefractionandopticaldamageresistanceinmgoandbi2o3codopedlinbo3crystals
AT kongyongfa thesimultaneousenhancementofphotorefractionandopticaldamageresistanceinmgoandbi2o3codopedlinbo3crystals
AT liushiguo thesimultaneousenhancementofphotorefractionandopticaldamageresistanceinmgoandbi2o3codopedlinbo3crystals
AT chenmuling thesimultaneousenhancementofphotorefractionandopticaldamageresistanceinmgoandbi2o3codopedlinbo3crystals
AT chenshaolin thesimultaneousenhancementofphotorefractionandopticaldamageresistanceinmgoandbi2o3codopedlinbo3crystals
AT zhangling thesimultaneousenhancementofphotorefractionandopticaldamageresistanceinmgoandbi2o3codopedlinbo3crystals
AT ruppromano thesimultaneousenhancementofphotorefractionandopticaldamageresistanceinmgoandbi2o3codopedlinbo3crystals
AT xujingjun thesimultaneousenhancementofphotorefractionandopticaldamageresistanceinmgoandbi2o3codopedlinbo3crystals
AT zhengdahuai simultaneousenhancementofphotorefractionandopticaldamageresistanceinmgoandbi2o3codopedlinbo3crystals
AT kongyongfa simultaneousenhancementofphotorefractionandopticaldamageresistanceinmgoandbi2o3codopedlinbo3crystals
AT liushiguo simultaneousenhancementofphotorefractionandopticaldamageresistanceinmgoandbi2o3codopedlinbo3crystals
AT chenmuling simultaneousenhancementofphotorefractionandopticaldamageresistanceinmgoandbi2o3codopedlinbo3crystals
AT chenshaolin simultaneousenhancementofphotorefractionandopticaldamageresistanceinmgoandbi2o3codopedlinbo3crystals
AT zhangling simultaneousenhancementofphotorefractionandopticaldamageresistanceinmgoandbi2o3codopedlinbo3crystals
AT ruppromano simultaneousenhancementofphotorefractionandopticaldamageresistanceinmgoandbi2o3codopedlinbo3crystals
AT xujingjun simultaneousenhancementofphotorefractionandopticaldamageresistanceinmgoandbi2o3codopedlinbo3crystals