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Controlling Catalyst Bulk Reservoir Effects for Monolayer Hexagonal Boron Nitride CVD

[Image: see text] Highly controlled Fe-catalyzed growth of monolayer hexagonal boron nitride (h-BN) films is demonstrated by the dissolution of nitrogen into the catalyst bulk via NH(3) exposure prior to the actual growth step. This “pre-filling” of the catalyst bulk reservoir allows us to control a...

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Autores principales: Caneva, Sabina, Weatherup, Robert S., Bayer, Bernhard C., Blume, Raoul, Cabrero-Vilatela, Andrea, Braeuninger-Weimer, Philipp, Martin, Marie-Blandine, Wang, Ruizhi, Baehtz, Carsten, Schloegl, Robert, Meyer, Jannik C., Hofmann, Stephan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2016
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4751513/
https://www.ncbi.nlm.nih.gov/pubmed/26756610
http://dx.doi.org/10.1021/acs.nanolett.5b04586
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author Caneva, Sabina
Weatherup, Robert S.
Bayer, Bernhard C.
Blume, Raoul
Cabrero-Vilatela, Andrea
Braeuninger-Weimer, Philipp
Martin, Marie-Blandine
Wang, Ruizhi
Baehtz, Carsten
Schloegl, Robert
Meyer, Jannik C.
Hofmann, Stephan
author_facet Caneva, Sabina
Weatherup, Robert S.
Bayer, Bernhard C.
Blume, Raoul
Cabrero-Vilatela, Andrea
Braeuninger-Weimer, Philipp
Martin, Marie-Blandine
Wang, Ruizhi
Baehtz, Carsten
Schloegl, Robert
Meyer, Jannik C.
Hofmann, Stephan
author_sort Caneva, Sabina
collection PubMed
description [Image: see text] Highly controlled Fe-catalyzed growth of monolayer hexagonal boron nitride (h-BN) films is demonstrated by the dissolution of nitrogen into the catalyst bulk via NH(3) exposure prior to the actual growth step. This “pre-filling” of the catalyst bulk reservoir allows us to control and limit the uptake of B and N species during borazine exposure and thereby to control the incubation time and h-BN growth kinetics while also limiting the contribution of uncontrolled precipitation-driven h-BN growth during cooling. Using in situ X-ray diffraction and in situ X-ray photoelectron spectroscopy combined with systematic growth calibrations, we develop an understanding and framework for engineering the catalyst bulk reservoir to optimize the growth process, which is also relevant to other 2D materials and their heterostructures.
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spelling pubmed-47515132016-02-19 Controlling Catalyst Bulk Reservoir Effects for Monolayer Hexagonal Boron Nitride CVD Caneva, Sabina Weatherup, Robert S. Bayer, Bernhard C. Blume, Raoul Cabrero-Vilatela, Andrea Braeuninger-Weimer, Philipp Martin, Marie-Blandine Wang, Ruizhi Baehtz, Carsten Schloegl, Robert Meyer, Jannik C. Hofmann, Stephan Nano Lett [Image: see text] Highly controlled Fe-catalyzed growth of monolayer hexagonal boron nitride (h-BN) films is demonstrated by the dissolution of nitrogen into the catalyst bulk via NH(3) exposure prior to the actual growth step. This “pre-filling” of the catalyst bulk reservoir allows us to control and limit the uptake of B and N species during borazine exposure and thereby to control the incubation time and h-BN growth kinetics while also limiting the contribution of uncontrolled precipitation-driven h-BN growth during cooling. Using in situ X-ray diffraction and in situ X-ray photoelectron spectroscopy combined with systematic growth calibrations, we develop an understanding and framework for engineering the catalyst bulk reservoir to optimize the growth process, which is also relevant to other 2D materials and their heterostructures. American Chemical Society 2016-01-12 2016-02-10 /pmc/articles/PMC4751513/ /pubmed/26756610 http://dx.doi.org/10.1021/acs.nanolett.5b04586 Text en Copyright © 2016 American Chemical Society This is an open access article published under a Creative Commons Attribution (CC-BY) License (http://pubs.acs.org/page/policy/authorchoice_ccby_termsofuse.html) , which permits unrestricted use, distribution and reproduction in any medium, provided the author and source are cited.
spellingShingle Caneva, Sabina
Weatherup, Robert S.
Bayer, Bernhard C.
Blume, Raoul
Cabrero-Vilatela, Andrea
Braeuninger-Weimer, Philipp
Martin, Marie-Blandine
Wang, Ruizhi
Baehtz, Carsten
Schloegl, Robert
Meyer, Jannik C.
Hofmann, Stephan
Controlling Catalyst Bulk Reservoir Effects for Monolayer Hexagonal Boron Nitride CVD
title Controlling Catalyst Bulk Reservoir Effects for Monolayer Hexagonal Boron Nitride CVD
title_full Controlling Catalyst Bulk Reservoir Effects for Monolayer Hexagonal Boron Nitride CVD
title_fullStr Controlling Catalyst Bulk Reservoir Effects for Monolayer Hexagonal Boron Nitride CVD
title_full_unstemmed Controlling Catalyst Bulk Reservoir Effects for Monolayer Hexagonal Boron Nitride CVD
title_short Controlling Catalyst Bulk Reservoir Effects for Monolayer Hexagonal Boron Nitride CVD
title_sort controlling catalyst bulk reservoir effects for monolayer hexagonal boron nitride cvd
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4751513/
https://www.ncbi.nlm.nih.gov/pubmed/26756610
http://dx.doi.org/10.1021/acs.nanolett.5b04586
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