A perfectly stoichiometric and flat CeO(2)(111) surface on a bulk-like ceria film

In surface science and model catalysis, cerium oxide (ceria) is mostly grown as an ultra-thin film on a metal substrate in the ultra-high vacuum to understand fundamental mechanisms involved in diverse surface chemistry processes. However, such ultra-thin films do not have the contribution of a bulk...

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Autores principales: Barth, C., Laffon, C., Olbrich, R., Ranguis, A., Parent, Ph., Reichling, M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4754737/
https://www.ncbi.nlm.nih.gov/pubmed/26879800
http://dx.doi.org/10.1038/srep21165
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author Barth, C.
Laffon, C.
Olbrich, R.
Ranguis, A.
Parent, Ph.
Reichling, M.
author_facet Barth, C.
Laffon, C.
Olbrich, R.
Ranguis, A.
Parent, Ph.
Reichling, M.
author_sort Barth, C.
collection PubMed
description In surface science and model catalysis, cerium oxide (ceria) is mostly grown as an ultra-thin film on a metal substrate in the ultra-high vacuum to understand fundamental mechanisms involved in diverse surface chemistry processes. However, such ultra-thin films do not have the contribution of a bulk ceria underneath, which is currently discussed to have a high impact on in particular surface redox processes. Here, we present a fully oxidized ceria thick film (180 nm) with a perfectly stoichiometric CeO(2)(111) surface exhibiting exceptionally large, atomically flat terraces. The film is well-suited for ceria model studies as well as a perfect substitute for CeO(2) bulk material.
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spelling pubmed-47547372016-02-24 A perfectly stoichiometric and flat CeO(2)(111) surface on a bulk-like ceria film Barth, C. Laffon, C. Olbrich, R. Ranguis, A. Parent, Ph. Reichling, M. Sci Rep Article In surface science and model catalysis, cerium oxide (ceria) is mostly grown as an ultra-thin film on a metal substrate in the ultra-high vacuum to understand fundamental mechanisms involved in diverse surface chemistry processes. However, such ultra-thin films do not have the contribution of a bulk ceria underneath, which is currently discussed to have a high impact on in particular surface redox processes. Here, we present a fully oxidized ceria thick film (180 nm) with a perfectly stoichiometric CeO(2)(111) surface exhibiting exceptionally large, atomically flat terraces. The film is well-suited for ceria model studies as well as a perfect substitute for CeO(2) bulk material. Nature Publishing Group 2016-02-16 /pmc/articles/PMC4754737/ /pubmed/26879800 http://dx.doi.org/10.1038/srep21165 Text en Copyright © 2016, Macmillan Publishers Limited http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
spellingShingle Article
Barth, C.
Laffon, C.
Olbrich, R.
Ranguis, A.
Parent, Ph.
Reichling, M.
A perfectly stoichiometric and flat CeO(2)(111) surface on a bulk-like ceria film
title A perfectly stoichiometric and flat CeO(2)(111) surface on a bulk-like ceria film
title_full A perfectly stoichiometric and flat CeO(2)(111) surface on a bulk-like ceria film
title_fullStr A perfectly stoichiometric and flat CeO(2)(111) surface on a bulk-like ceria film
title_full_unstemmed A perfectly stoichiometric and flat CeO(2)(111) surface on a bulk-like ceria film
title_short A perfectly stoichiometric and flat CeO(2)(111) surface on a bulk-like ceria film
title_sort perfectly stoichiometric and flat ceo(2)(111) surface on a bulk-like ceria film
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4754737/
https://www.ncbi.nlm.nih.gov/pubmed/26879800
http://dx.doi.org/10.1038/srep21165
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