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Low-temperature growth of layered molybdenum disulphide with controlled clusters
Layered molybdenum disulphide was grown at a low-temperature of 350 °C using chemical vapour deposition by elaborately controlling the cluster size. The molybdenum disulphide grown under various sulphur-reaction-gas to molybdenum-precursor partial-pressure ratios were examined. Using spectroscopy an...
Autores principales: | Mun, Jihun, Kim, Yeongseok, Kang, Il-Suk, Lim, Sung Kyu, Lee, Sang Jun, Kim, Jeong Won, Park, Hyun Min, Kim, Taesung, Kang, Sang-Woo |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2016
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4763177/ https://www.ncbi.nlm.nih.gov/pubmed/26902316 http://dx.doi.org/10.1038/srep21854 |
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