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Low-temperature growth of layered molybdenum disulphide with controlled clusters

Layered molybdenum disulphide was grown at a low-temperature of 350 °C using chemical vapour deposition by elaborately controlling the cluster size. The molybdenum disulphide grown under various sulphur-reaction-gas to molybdenum-precursor partial-pressure ratios were examined. Using spectroscopy an...

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Detalles Bibliográficos
Autores principales: Mun, Jihun, Kim, Yeongseok, Kang, Il-Suk, Lim, Sung Kyu, Lee, Sang Jun, Kim, Jeong Won, Park, Hyun Min, Kim, Taesung, Kang, Sang-Woo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4763177/
https://www.ncbi.nlm.nih.gov/pubmed/26902316
http://dx.doi.org/10.1038/srep21854

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