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Morphological evolution of self-deposition Bi(2)Se(3) nanosheets by oxygen plasma treatment

Bi(2)Se(3) nanosheets were successfully synthesized by a microwave-assisted approach in the presence of polyvinylpyrroli done at a temperature of 180 °C for 2 h. The thin film was prepared on a silicon wafer via a self-deposition process in a Bi(2)Se(3) nanosheet ink solution using the evaporation-i...

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Detalles Bibliográficos
Autores principales: Jia, Guozhi, Wu, Zengna, Wang, Peng, Yao, Jianghong, Chang, Kai
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4770589/
https://www.ncbi.nlm.nih.gov/pubmed/26923325
http://dx.doi.org/10.1038/srep22191
Descripción
Sumario:Bi(2)Se(3) nanosheets were successfully synthesized by a microwave-assisted approach in the presence of polyvinylpyrroli done at a temperature of 180 °C for 2 h. The thin film was prepared on a silicon wafer via a self-deposition process in a Bi(2)Se(3) nanosheet ink solution using the evaporation-induced self-assembly method. The structure and morphology of the obtained products were characterized by X-ray diffraction, scanning electron microscopy (SEM), x-ray photoelectron spectroscopy, and Raman spectroscopy. The highly uniform Bi(2)Se(3) particles could be formed by controlling the oxygen plasma treatment time. After the plasma pretreatment from 10 to 20 s, the surface of Bi(2)Se(3) film evolved from the worm-like structure to particles. The highly uniform thin film was formed on further increasing the plasma treatment time, which is consistent with the observed SEM results. Several important processes can result in the morphological evolution of Bi(2)Se(3) nanosheets: (1) formation of Bi(2)Se(3) oxide layer; (2) self-assembly of oxide nanoparticles under the action of high-energy oxygen plasma; and (3) electrostatic interaction and etching mechanism.