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Conduction Threshold in Accumulation-Mode InGaZnO Thin Film Transistors

The onset of inversion in the metal-oxide-semiconductor field-effect transistor (MOSFET) takes place when the surface potential is approximately twice the bulk potential. In contrast, the conduction threshold in accumulation mode transistors, such as the oxide thin film transistor (TFT), has remaine...

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Detalles Bibliográficos
Autores principales: Lee, Sungsik, Nathan, Arokia
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4773861/
https://www.ncbi.nlm.nih.gov/pubmed/26932790
http://dx.doi.org/10.1038/srep22567
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author Lee, Sungsik
Nathan, Arokia
author_facet Lee, Sungsik
Nathan, Arokia
author_sort Lee, Sungsik
collection PubMed
description The onset of inversion in the metal-oxide-semiconductor field-effect transistor (MOSFET) takes place when the surface potential is approximately twice the bulk potential. In contrast, the conduction threshold in accumulation mode transistors, such as the oxide thin film transistor (TFT), has remained ambiguous in view of the complex density of states distribution in the mobility gap. This paper quantitatively describes the conduction threshold of accumulation-mode InGaZnO TFTs as the transition of the Fermi level from deep to tail states, which can be defined as the juxtaposition of linear and exponential dependencies of the accumulated carrier density on energy. Indeed, this permits direct extraction and visualization of the threshold voltage in terms of the second derivative of the drain current with respect to gate voltage.
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spelling pubmed-47738612016-03-09 Conduction Threshold in Accumulation-Mode InGaZnO Thin Film Transistors Lee, Sungsik Nathan, Arokia Sci Rep Article The onset of inversion in the metal-oxide-semiconductor field-effect transistor (MOSFET) takes place when the surface potential is approximately twice the bulk potential. In contrast, the conduction threshold in accumulation mode transistors, such as the oxide thin film transistor (TFT), has remained ambiguous in view of the complex density of states distribution in the mobility gap. This paper quantitatively describes the conduction threshold of accumulation-mode InGaZnO TFTs as the transition of the Fermi level from deep to tail states, which can be defined as the juxtaposition of linear and exponential dependencies of the accumulated carrier density on energy. Indeed, this permits direct extraction and visualization of the threshold voltage in terms of the second derivative of the drain current with respect to gate voltage. Nature Publishing Group 2016-03-02 /pmc/articles/PMC4773861/ /pubmed/26932790 http://dx.doi.org/10.1038/srep22567 Text en Copyright © 2016, Macmillan Publishers Limited http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
spellingShingle Article
Lee, Sungsik
Nathan, Arokia
Conduction Threshold in Accumulation-Mode InGaZnO Thin Film Transistors
title Conduction Threshold in Accumulation-Mode InGaZnO Thin Film Transistors
title_full Conduction Threshold in Accumulation-Mode InGaZnO Thin Film Transistors
title_fullStr Conduction Threshold in Accumulation-Mode InGaZnO Thin Film Transistors
title_full_unstemmed Conduction Threshold in Accumulation-Mode InGaZnO Thin Film Transistors
title_short Conduction Threshold in Accumulation-Mode InGaZnO Thin Film Transistors
title_sort conduction threshold in accumulation-mode ingazno thin film transistors
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4773861/
https://www.ncbi.nlm.nih.gov/pubmed/26932790
http://dx.doi.org/10.1038/srep22567
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