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Sub-10 nm feature chromium photomasks for contact lithography patterning of square metal ring arrays
Advances in photolithographic processes have allowed semiconductor industries to manufacture smaller and denser chips. As the feature size of integrated circuits becomes smaller, there has been a growing need for a photomask embedded with ever narrower patterns. However, it is challenging for electr...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group
2016
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4812291/ https://www.ncbi.nlm.nih.gov/pubmed/27025277 http://dx.doi.org/10.1038/srep23823 |