Silicon-Doped Titanium Dioxide Nanotubes Promoted Bone Formation on Titanium Implants

While titanium (Ti) implants have been extensively used in orthopaedic and dental applications, the intrinsic bioinertness of untreated Ti surface usually results in insufficient osseointegration irrespective of the excellent biocompatibility and mechanical properties of it. In this study, we prepared surface modified Ti substrates in which silicon (Si) was doped into the titanium dioxide (TiO(2)) nanotubes on Ti surface using plasma immersion ion implantation (PIII) technology. Compared to TiO(2) nanotubes and Ti alone, Si-doped TiO(2) nanotubes significantly enhanced the expression of genes related to osteogenic differentiation, including Col-I, ALP, Runx2, OCN, and OPN, in mouse pre-osteoblastic MC3T3-E1 cells and deposition of mineral matrix. In vivo, the pull-out mechanical tests after two weeks of implantation in rat femur showed that Si-doped TiO(2) nanotubes improved implant fixation strength by 18% and 54% compared to TiO(2)-NT and Ti implants, respectively. Together, findings from this study indicate that Si-doped TiO(2) nanotubes promoted the osteogenic differentiation of osteoblastic cells and improved bone-Ti integration. Therefore, they may have considerable potential for the bioactive surface modification of Ti implants.