Cargando…

Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography

Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer extreme-ultraviolet stepper mirrors require the highest attainable reflectivity at 13 nm (nearly 70 %), but the cent...

Descripción completa

Detalles Bibliográficos
Autores principales:	Tarrio, Charles, Grantham, Steven, Squires, Matthew B., Vest, Robert E., Lucatorto, Thomas B.
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	[Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 2003
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4846234/ https://www.ncbi.nlm.nih.gov/pubmed/27413610 http://dx.doi.org/10.6028/jres.108.025

Ejemplares similares

Method for the Characterization of Extreme-Ultraviolet Photoresist Outgassing
por: Tarrio, Charles
Publicado: (2009)

Chemically Amplified Molecular Glass Photoresist Regulated by 2-Aminoanthracene Additive for Electron Beam Lithography and Extreme Ultraviolet Lithography
por: Zhang, Siliang, et al.
Publicado: (2023)

Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance
por: Thakur, Neha, et al.
Publicado: (2022)

Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography
por: Rohdenburg, Markus, et al.
Publicado: (2021)

Line-Edge Roughness from Extreme Ultraviolet Lithography to Fin-Field-Effect-Transistor: Computational Study
por: Kim, Sang-Kon
Publicado: (2021)

Vacuum ultraviolet spectroscopy I
por: Samson, James A, et al.
Publicado: (1998)

High-Durability Photothermal Slippery Surfaces for Droplet Manipulation Based on Ultraviolet Lithography
por: Wen, Tong, et al.
Publicado: (2023)

Comprehensive Simulations for Ultraviolet Lithography Process of Thick SU-8 Photoresist
por: Zhou, Zai-Fa, et al.
Publicado: (2018)

Ultraviolet Laser Lithography of Titania Photonic Crystals for Terahertz-Wave Modulation
por: Kirihara, Soshu, et al.
Publicado: (2018)

An Ultraviolet-Lithography-Assisted Sintering Method for Glass Microlens Array Fabrication
por: Zuo, Fangyuan, et al.
Publicado: (2023)

Extreme ultraviolet astronomy
por: Barstow, Martin A, et al.
Publicado: (2003)

Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources
por: Tomita, Kentaro, et al.
Publicado: (2017)

Resonant neutron reflectometry for hydrogen detection
por: Guasco, L., et al.
Publicado: (2022)

Manufacture of Binary Nanofeatured Polymeric Films Using Nanosphere Lithography and Ultraviolet Roller Imprinting
por: Lee, Demei, et al.
Publicado: (2021)

Time-domain reflectometry measurements
por: Frye, George, et al.
Publicado: (1970)

Optomechanical time-domain reflectometry
por: Bashan, Gil, et al.
Publicado: (2018)

Terahertz reflectometry imaging for low and high grade gliomas
por: Ji, Young Bin, et al.
Publicado: (2016)

Optimization of reflectometry experiments using information theory
por: Treece, Bradley W., et al.
Publicado: (2019)

Extreme–ultraviolet high–harmonic generation in liquids
por: Luu, Tran Trung, et al.
Publicado: (2018)

Superior nanopatterns via adjustable nanoimprint lithography on aluminum oxide in high-K thin films with ultraviolet curable polymer
por: Oh, Jin Young, et al.
Publicado: (2021)

Fabrication of a 100 × 100 mm(2) nanometer-thick graphite pellicle for extreme ultraviolet lithography by a peel-off and camphor-supported transfer approach
por: Nam, Ki-Bong, et al.
Publicado: (2022)

Ultrahigh-speed distributed Brillouin reflectometry
por: Mizuno, Yosuke, et al.
Publicado: (2016)

Optimizing experimental design in neutron reflectometry
por: Durant, James H., et al.
Publicado: (2022)

Terahertz reflectometry of burn wounds in a rat model
por: Arbab, M. Hassan, et al.
Publicado: (2011)

Two Decades of Arrayed Imaging Reflectometry for Sensitive, High-Throughput Biosensing
por: Kosoy, Gabrielle, et al.
Publicado: (2023)

Neutron reflectometry under high shear in narrow gap for tribology study
por: Yamashita, Naoki, et al.
Publicado: (2023)

Towards a neutron and X-ray reflectometry environment for the study of solid–liquid interfaces under shear
por: Armstrong, Alexander J., et al.
Publicado: (2021)

Wetland monitoring with Global Navigation Satellite System reflectometry
por: Nghiem, Son V., et al.
Publicado: (2017)

Fine line lithography
por: Newman, Robert
Publicado: (1980)

Ultraviolet Lithography-Based Ceramic Manufacturing (UV-LCM) of the Aluminum Nitride (AlN)-Based Photocurable Dispersions
por: Ożóg, Paulina, et al.
Publicado: (2020)

Direct Optical Lithography Enabled Multispectral Colloidal Quantum-Dot Imagers from Ultraviolet to Short-Wave Infrared
por: Zhang, Shuo, et al.
Publicado: (2022)

Nanoimprint lithography for nanodevice fabrication
por: Barcelo, Steven, et al.
Publicado: (2016)

Material-specific high-resolution table-top extreme ultraviolet microscopy
por: Eschen, Wilhelm, et al.
Publicado: (2022)

High‐Throughput Contact Flow Lithography
por: Le Goff, Gaelle C., et al.
Publicado: (2015)

Extreme-ultraviolet wavelength and lifetime measurements in highly ionized krypton
por: Kukla, K W, et al.
Publicado: (2005)

A Double Transducer for High Precision Ultrasonic Time-Domain Reflectometry Measurements
por: Stade, Sam, et al.
Publicado: (2015)

Computational lithography
por: Ma, Xu, et al.
Publicado: (2010)

Nano lithography
por: Landis, Stefan
Publicado: (2013)

EUV lithography
por: Bakshi, Vivek
Publicado: (2018)

Transverse Deflection for Extreme Ultraviolet Pellicles
por: Kim, Sang-Kon
Publicado: (2023)

Cannot write session to /tmp/vufind_sessions/sess_9cg5hd3taftdu09uj0evidc79d