Temperature Dependence of the Hall and Longitudinal Resistances in a Quantum Hall Resistance Standard

We present detailed measurements of the temperature dependence of the Hall and longitudinal resistances on a quantum Hall device [(GaAs(7)] which has been used as a resistance standard at NIST. We find a simple power law relationship between the change in Hall resistance and the longitudinal resista...

Descripción completa

Detalles Bibliográficos
Autores principales: Matthews, J., Cage, M. E.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 2005
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4847578/
https://www.ncbi.nlm.nih.gov/pubmed/27308175
http://dx.doi.org/10.6028/jres.110.078
_version_ 1782429241203228672
author Matthews, J.
Cage, M. E.
author_facet Matthews, J.
Cage, M. E.
author_sort Matthews, J.
collection PubMed
description We present detailed measurements of the temperature dependence of the Hall and longitudinal resistances on a quantum Hall device [(GaAs(7)] which has been used as a resistance standard at NIST. We find a simple power law relationship between the change in Hall resistance and the longitudinal resistance as the temperature is varied between 1.4 K and 36 K. This power law holds over seven orders of magnitude change in the Hall resistance. We fit the temperature dependence above about 4 K to thermal activation, and extract the energy gap and the effective g-factor.
format Online
Article
Text
id pubmed-4847578
institution National Center for Biotechnology Information
language English
publishDate 2005
publisher [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology
record_format MEDLINE/PubMed
spelling pubmed-48475782016-06-15 Temperature Dependence of the Hall and Longitudinal Resistances in a Quantum Hall Resistance Standard Matthews, J. Cage, M. E. J Res Natl Inst Stand Technol Article We present detailed measurements of the temperature dependence of the Hall and longitudinal resistances on a quantum Hall device [(GaAs(7)] which has been used as a resistance standard at NIST. We find a simple power law relationship between the change in Hall resistance and the longitudinal resistance as the temperature is varied between 1.4 K and 36 K. This power law holds over seven orders of magnitude change in the Hall resistance. We fit the temperature dependence above about 4 K to thermal activation, and extract the energy gap and the effective g-factor. [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 2005 2005-10-01 /pmc/articles/PMC4847578/ /pubmed/27308175 http://dx.doi.org/10.6028/jres.110.078 Text en https://creativecommons.org/publicdomain/zero/1.0/ The Journal of Research of the National Institute of Standards and Technology is a publication of the U.S. Government. The papers are in the public domain and are not subject to copyright in the United States. Articles from J Res may contain photographs or illustrations copyrighted by other commercial organizations or individuals that may not be used without obtaining prior approval from the holder of the copyright.
spellingShingle Article
Matthews, J.
Cage, M. E.
Temperature Dependence of the Hall and Longitudinal Resistances in a Quantum Hall Resistance Standard
title Temperature Dependence of the Hall and Longitudinal Resistances in a Quantum Hall Resistance Standard
title_full Temperature Dependence of the Hall and Longitudinal Resistances in a Quantum Hall Resistance Standard
title_fullStr Temperature Dependence of the Hall and Longitudinal Resistances in a Quantum Hall Resistance Standard
title_full_unstemmed Temperature Dependence of the Hall and Longitudinal Resistances in a Quantum Hall Resistance Standard
title_short Temperature Dependence of the Hall and Longitudinal Resistances in a Quantum Hall Resistance Standard
title_sort temperature dependence of the hall and longitudinal resistances in a quantum hall resistance standard
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4847578/
https://www.ncbi.nlm.nih.gov/pubmed/27308175
http://dx.doi.org/10.6028/jres.110.078
work_keys_str_mv AT matthewsj temperaturedependenceofthehallandlongitudinalresistancesinaquantumhallresistancestandard
AT cageme temperaturedependenceofthehallandlongitudinalresistancesinaquantumhallresistancestandard

Ejemplares similares