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Slip Correction Measurements of Certified PSL Nanoparticles Using a Nanometer Differential Mobility Analyzer (Nano-DMA) for Knudsen Number From 0.5 to 83

The slip correction factor has been investigated at reduced pressures and high Knudsen number using polystyrene latex (PSL) particles. Nano-differential mobility analyzers (NDMA) were used in determining the slip correction factor by measuring the electrical mobility of 100.7 nm, 269 nm, and 19.90 n...

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Autores principales: Kim, Jung Hyeun, Mulholland, George W., Kukuck, Scott R., Pui, David Y. H.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 2005
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4849562/
https://www.ncbi.nlm.nih.gov/pubmed/27308102
http://dx.doi.org/10.6028/jres.110.005
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author Kim, Jung Hyeun
Mulholland, George W.
Kukuck, Scott R.
Pui, David Y. H.
author_facet Kim, Jung Hyeun
Mulholland, George W.
Kukuck, Scott R.
Pui, David Y. H.
author_sort Kim, Jung Hyeun
collection PubMed
description The slip correction factor has been investigated at reduced pressures and high Knudsen number using polystyrene latex (PSL) particles. Nano-differential mobility analyzers (NDMA) were used in determining the slip correction factor by measuring the electrical mobility of 100.7 nm, 269 nm, and 19.90 nm particles as a function of pressure. The aerosol was generated via electrospray to avoid multiplets for the 19.90 nm particles and to reduce the contaminant residue on the particle surface. System pressure was varied down to 8.27 kPa, enabling slip correction measurements for Knudsen numbers as large as 83. A condensation particle counter was modified for low pressure application. The slip correction factor obtained for the three particle sizes is fitted well by the equation: C = 1 + Kn (α + β exp(−γ/Kn)), with α = 1.165, β = 0.483, and γ = 0.997. The first quantitative uncertainty analysis for slip correction measurements was carried out. The expanded relative uncertainty (95 % confidence interval) in measuring slip correction factor was about 2 % for the 100.7 nm SRM particles, about 3 % for the 19.90 nm PSL particles, and about 2.5 % for the 269 nm SRM particles. The major sources of uncertainty are the diameter of particles, the geometric constant associated with NDMA, and the voltage.
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spelling pubmed-48495622016-06-15 Slip Correction Measurements of Certified PSL Nanoparticles Using a Nanometer Differential Mobility Analyzer (Nano-DMA) for Knudsen Number From 0.5 to 83 Kim, Jung Hyeun Mulholland, George W. Kukuck, Scott R. Pui, David Y. H. J Res Natl Inst Stand Technol Article The slip correction factor has been investigated at reduced pressures and high Knudsen number using polystyrene latex (PSL) particles. Nano-differential mobility analyzers (NDMA) were used in determining the slip correction factor by measuring the electrical mobility of 100.7 nm, 269 nm, and 19.90 nm particles as a function of pressure. The aerosol was generated via electrospray to avoid multiplets for the 19.90 nm particles and to reduce the contaminant residue on the particle surface. System pressure was varied down to 8.27 kPa, enabling slip correction measurements for Knudsen numbers as large as 83. A condensation particle counter was modified for low pressure application. The slip correction factor obtained for the three particle sizes is fitted well by the equation: C = 1 + Kn (α + β exp(−γ/Kn)), with α = 1.165, β = 0.483, and γ = 0.997. The first quantitative uncertainty analysis for slip correction measurements was carried out. The expanded relative uncertainty (95 % confidence interval) in measuring slip correction factor was about 2 % for the 100.7 nm SRM particles, about 3 % for the 19.90 nm PSL particles, and about 2.5 % for the 269 nm SRM particles. The major sources of uncertainty are the diameter of particles, the geometric constant associated with NDMA, and the voltage. [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 2005 2005-02-01 /pmc/articles/PMC4849562/ /pubmed/27308102 http://dx.doi.org/10.6028/jres.110.005 Text en https://creativecommons.org/publicdomain/zero/1.0/ The Journal of Research of the National Institute of Standards and Technology is a publication of the U.S. Government. The papers are in the public domain and are not subject to copyright in the United States. Articles from J Res may contain photographs or illustrations copyrighted by other commercial organizations or individuals that may not be used without obtaining prior approval from the holder of the copyright.
spellingShingle Article
Kim, Jung Hyeun
Mulholland, George W.
Kukuck, Scott R.
Pui, David Y. H.
Slip Correction Measurements of Certified PSL Nanoparticles Using a Nanometer Differential Mobility Analyzer (Nano-DMA) for Knudsen Number From 0.5 to 83
title Slip Correction Measurements of Certified PSL Nanoparticles Using a Nanometer Differential Mobility Analyzer (Nano-DMA) for Knudsen Number From 0.5 to 83
title_full Slip Correction Measurements of Certified PSL Nanoparticles Using a Nanometer Differential Mobility Analyzer (Nano-DMA) for Knudsen Number From 0.5 to 83
title_fullStr Slip Correction Measurements of Certified PSL Nanoparticles Using a Nanometer Differential Mobility Analyzer (Nano-DMA) for Knudsen Number From 0.5 to 83
title_full_unstemmed Slip Correction Measurements of Certified PSL Nanoparticles Using a Nanometer Differential Mobility Analyzer (Nano-DMA) for Knudsen Number From 0.5 to 83
title_short Slip Correction Measurements of Certified PSL Nanoparticles Using a Nanometer Differential Mobility Analyzer (Nano-DMA) for Knudsen Number From 0.5 to 83
title_sort slip correction measurements of certified psl nanoparticles using a nanometer differential mobility analyzer (nano-dma) for knudsen number from 0.5 to 83
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4849562/
https://www.ncbi.nlm.nih.gov/pubmed/27308102
http://dx.doi.org/10.6028/jres.110.005
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