Cargando…

Humidity influenced capacitance and resistance of an Al/DNA/Al Schottky diode irradiated by alpha particles

Deoxyribonucleic acid or DNA based sensors, especially as humidity and alpha particle sensors have become quite popular in recent times due to flexible and highly optimizable nature of this fundamental biomaterial. Application of DNA electronics allow for more sensitive, accurate and effective senso...

Descripción completa

Detalles Bibliográficos
Autores principales: Al-Ta’ii, Hassan Maktuff Jaber, Amin, Yusoff Mohd, Periasamy, Vengadesh
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4861926/
https://www.ncbi.nlm.nih.gov/pubmed/27160654
http://dx.doi.org/10.1038/srep25519
_version_ 1782431278559133696
author Al-Ta’ii, Hassan Maktuff Jaber
Amin, Yusoff Mohd
Periasamy, Vengadesh
author_facet Al-Ta’ii, Hassan Maktuff Jaber
Amin, Yusoff Mohd
Periasamy, Vengadesh
author_sort Al-Ta’ii, Hassan Maktuff Jaber
collection PubMed
description Deoxyribonucleic acid or DNA based sensors, especially as humidity and alpha particle sensors have become quite popular in recent times due to flexible and highly optimizable nature of this fundamental biomaterial. Application of DNA electronics allow for more sensitive, accurate and effective sensors to be developed and fabricated. In this work, we examined the effect of different humidity conditions on the capacitive and resistive response of Aluminum (Al)/DNA/Al Schottky barrier structure when bombarded by time-dependent dosages of alpha particles. Based on current-voltage profiles, which demonstrated rectifying behaviours, Schottky diode parameters such as ideality factor, barrier height and series resistance was calculated. Results observed generally pointed towards a decrease in the resistance value from the pristine to the radiated structures. It was also demonstrated that under the effect of humidity, the capacitance of the DNA thin film increased from 0.05894 to 92.736 nF, with rising relative humidity level. We also observed the occurrence of the hypersensitivity phenomena after alpha irradiation between 2 to 4 min by observing a drop in the series resistance, crucial in the study of DNA damage and repair mechanisms. These observations may also suggest the exciting possibility of utilizing Al/DNA/Al Schottky diodes as potentially sensitive humidity sensors.
format Online
Article
Text
id pubmed-4861926
institution National Center for Biotechnology Information
language English
publishDate 2016
publisher Nature Publishing Group
record_format MEDLINE/PubMed
spelling pubmed-48619262016-05-20 Humidity influenced capacitance and resistance of an Al/DNA/Al Schottky diode irradiated by alpha particles Al-Ta’ii, Hassan Maktuff Jaber Amin, Yusoff Mohd Periasamy, Vengadesh Sci Rep Article Deoxyribonucleic acid or DNA based sensors, especially as humidity and alpha particle sensors have become quite popular in recent times due to flexible and highly optimizable nature of this fundamental biomaterial. Application of DNA electronics allow for more sensitive, accurate and effective sensors to be developed and fabricated. In this work, we examined the effect of different humidity conditions on the capacitive and resistive response of Aluminum (Al)/DNA/Al Schottky barrier structure when bombarded by time-dependent dosages of alpha particles. Based on current-voltage profiles, which demonstrated rectifying behaviours, Schottky diode parameters such as ideality factor, barrier height and series resistance was calculated. Results observed generally pointed towards a decrease in the resistance value from the pristine to the radiated structures. It was also demonstrated that under the effect of humidity, the capacitance of the DNA thin film increased from 0.05894 to 92.736 nF, with rising relative humidity level. We also observed the occurrence of the hypersensitivity phenomena after alpha irradiation between 2 to 4 min by observing a drop in the series resistance, crucial in the study of DNA damage and repair mechanisms. These observations may also suggest the exciting possibility of utilizing Al/DNA/Al Schottky diodes as potentially sensitive humidity sensors. Nature Publishing Group 2016-05-10 /pmc/articles/PMC4861926/ /pubmed/27160654 http://dx.doi.org/10.1038/srep25519 Text en Copyright © 2016, Macmillan Publishers Limited http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
spellingShingle Article
Al-Ta’ii, Hassan Maktuff Jaber
Amin, Yusoff Mohd
Periasamy, Vengadesh
Humidity influenced capacitance and resistance of an Al/DNA/Al Schottky diode irradiated by alpha particles
title Humidity influenced capacitance and resistance of an Al/DNA/Al Schottky diode irradiated by alpha particles
title_full Humidity influenced capacitance and resistance of an Al/DNA/Al Schottky diode irradiated by alpha particles
title_fullStr Humidity influenced capacitance and resistance of an Al/DNA/Al Schottky diode irradiated by alpha particles
title_full_unstemmed Humidity influenced capacitance and resistance of an Al/DNA/Al Schottky diode irradiated by alpha particles
title_short Humidity influenced capacitance and resistance of an Al/DNA/Al Schottky diode irradiated by alpha particles
title_sort humidity influenced capacitance and resistance of an al/dna/al schottky diode irradiated by alpha particles
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4861926/
https://www.ncbi.nlm.nih.gov/pubmed/27160654
http://dx.doi.org/10.1038/srep25519
work_keys_str_mv AT altaiihassanmaktuffjaber humidityinfluencedcapacitanceandresistanceofanaldnaalschottkydiodeirradiatedbyalphaparticles
AT aminyusoffmohd humidityinfluencedcapacitanceandresistanceofanaldnaalschottkydiodeirradiatedbyalphaparticles
AT periasamyvengadesh humidityinfluencedcapacitanceandresistanceofanaldnaalschottkydiodeirradiatedbyalphaparticles