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Humidity influenced capacitance and resistance of an Al/DNA/Al Schottky diode irradiated by alpha particles
Deoxyribonucleic acid or DNA based sensors, especially as humidity and alpha particle sensors have become quite popular in recent times due to flexible and highly optimizable nature of this fundamental biomaterial. Application of DNA electronics allow for more sensitive, accurate and effective senso...
Autores principales: | , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2016
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4861926/ https://www.ncbi.nlm.nih.gov/pubmed/27160654 http://dx.doi.org/10.1038/srep25519 |
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author | Al-Ta’ii, Hassan Maktuff Jaber Amin, Yusoff Mohd Periasamy, Vengadesh |
author_facet | Al-Ta’ii, Hassan Maktuff Jaber Amin, Yusoff Mohd Periasamy, Vengadesh |
author_sort | Al-Ta’ii, Hassan Maktuff Jaber |
collection | PubMed |
description | Deoxyribonucleic acid or DNA based sensors, especially as humidity and alpha particle sensors have become quite popular in recent times due to flexible and highly optimizable nature of this fundamental biomaterial. Application of DNA electronics allow for more sensitive, accurate and effective sensors to be developed and fabricated. In this work, we examined the effect of different humidity conditions on the capacitive and resistive response of Aluminum (Al)/DNA/Al Schottky barrier structure when bombarded by time-dependent dosages of alpha particles. Based on current-voltage profiles, which demonstrated rectifying behaviours, Schottky diode parameters such as ideality factor, barrier height and series resistance was calculated. Results observed generally pointed towards a decrease in the resistance value from the pristine to the radiated structures. It was also demonstrated that under the effect of humidity, the capacitance of the DNA thin film increased from 0.05894 to 92.736 nF, with rising relative humidity level. We also observed the occurrence of the hypersensitivity phenomena after alpha irradiation between 2 to 4 min by observing a drop in the series resistance, crucial in the study of DNA damage and repair mechanisms. These observations may also suggest the exciting possibility of utilizing Al/DNA/Al Schottky diodes as potentially sensitive humidity sensors. |
format | Online Article Text |
id | pubmed-4861926 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2016 |
publisher | Nature Publishing Group |
record_format | MEDLINE/PubMed |
spelling | pubmed-48619262016-05-20 Humidity influenced capacitance and resistance of an Al/DNA/Al Schottky diode irradiated by alpha particles Al-Ta’ii, Hassan Maktuff Jaber Amin, Yusoff Mohd Periasamy, Vengadesh Sci Rep Article Deoxyribonucleic acid or DNA based sensors, especially as humidity and alpha particle sensors have become quite popular in recent times due to flexible and highly optimizable nature of this fundamental biomaterial. Application of DNA electronics allow for more sensitive, accurate and effective sensors to be developed and fabricated. In this work, we examined the effect of different humidity conditions on the capacitive and resistive response of Aluminum (Al)/DNA/Al Schottky barrier structure when bombarded by time-dependent dosages of alpha particles. Based on current-voltage profiles, which demonstrated rectifying behaviours, Schottky diode parameters such as ideality factor, barrier height and series resistance was calculated. Results observed generally pointed towards a decrease in the resistance value from the pristine to the radiated structures. It was also demonstrated that under the effect of humidity, the capacitance of the DNA thin film increased from 0.05894 to 92.736 nF, with rising relative humidity level. We also observed the occurrence of the hypersensitivity phenomena after alpha irradiation between 2 to 4 min by observing a drop in the series resistance, crucial in the study of DNA damage and repair mechanisms. These observations may also suggest the exciting possibility of utilizing Al/DNA/Al Schottky diodes as potentially sensitive humidity sensors. Nature Publishing Group 2016-05-10 /pmc/articles/PMC4861926/ /pubmed/27160654 http://dx.doi.org/10.1038/srep25519 Text en Copyright © 2016, Macmillan Publishers Limited http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ |
spellingShingle | Article Al-Ta’ii, Hassan Maktuff Jaber Amin, Yusoff Mohd Periasamy, Vengadesh Humidity influenced capacitance and resistance of an Al/DNA/Al Schottky diode irradiated by alpha particles |
title | Humidity influenced capacitance and resistance of an Al/DNA/Al Schottky diode irradiated by alpha particles |
title_full | Humidity influenced capacitance and resistance of an Al/DNA/Al Schottky diode irradiated by alpha particles |
title_fullStr | Humidity influenced capacitance and resistance of an Al/DNA/Al Schottky diode irradiated by alpha particles |
title_full_unstemmed | Humidity influenced capacitance and resistance of an Al/DNA/Al Schottky diode irradiated by alpha particles |
title_short | Humidity influenced capacitance and resistance of an Al/DNA/Al Schottky diode irradiated by alpha particles |
title_sort | humidity influenced capacitance and resistance of an al/dna/al schottky diode irradiated by alpha particles |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4861926/ https://www.ncbi.nlm.nih.gov/pubmed/27160654 http://dx.doi.org/10.1038/srep25519 |
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