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Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell

The use of a Langmuir probe system in two GEC cells is reviewed. The major problems associated with probe diagnostics in a GEC cell are outlined and discussed. While the data base is still insufficient to give definitive values for many parameters, a number of standard measurements are put forward....

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Autor principal: Hopkins, M. B.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 1995
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4887235/
https://www.ncbi.nlm.nih.gov/pubmed/29151751
http://dx.doi.org/10.6028/jres.100.031
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author Hopkins, M. B.
author_facet Hopkins, M. B.
author_sort Hopkins, M. B.
collection PubMed
description The use of a Langmuir probe system in two GEC cells is reviewed. The major problems associated with probe diagnostics in a GEC cell are outlined and discussed. While the data base is still insufficient to give definitive values for many parameters, a number of standard measurements are put forward. The plasma density in argon is 9×10(9) cm(−3) (±20 %) at an applied rf voltage of 250 V (500 V peak to peak) and a gas pressure of 13.3 Pa (100 mTorr). The electron density scales linearly with applied voltage. The plasma to ground sheath resistance is shown to be very important with a value of 810 Ω in argon at a pressure of 13.3 Pa (100 mTorr) and discharge current of 0.1 A. The value of plasma to ground resistance scales inversely with discharge current and sublinear with pressure. Two standard features in the electron energy distribution function (EEDF) have been proposed as a test of the ability of a probe system to resolve features, first, the transition from a low temperature (<1 eV) bi-Maxwellian distribution to a Druyveysten distribution (3 eV) at 13.3 Pa (100 mTorr) in argon, and the “hole” in the EEDF at 2 eV to 4 eV in nitrogen plasmas.
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spelling pubmed-48872352017-11-17 Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell Hopkins, M. B. J Res Natl Inst Stand Technol Article The use of a Langmuir probe system in two GEC cells is reviewed. The major problems associated with probe diagnostics in a GEC cell are outlined and discussed. While the data base is still insufficient to give definitive values for many parameters, a number of standard measurements are put forward. The plasma density in argon is 9×10(9) cm(−3) (±20 %) at an applied rf voltage of 250 V (500 V peak to peak) and a gas pressure of 13.3 Pa (100 mTorr). The electron density scales linearly with applied voltage. The plasma to ground sheath resistance is shown to be very important with a value of 810 Ω in argon at a pressure of 13.3 Pa (100 mTorr) and discharge current of 0.1 A. The value of plasma to ground resistance scales inversely with discharge current and sublinear with pressure. Two standard features in the electron energy distribution function (EEDF) have been proposed as a test of the ability of a probe system to resolve features, first, the transition from a low temperature (<1 eV) bi-Maxwellian distribution to a Druyveysten distribution (3 eV) at 13.3 Pa (100 mTorr) in argon, and the “hole” in the EEDF at 2 eV to 4 eV in nitrogen plasmas. [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 1995 /pmc/articles/PMC4887235/ /pubmed/29151751 http://dx.doi.org/10.6028/jres.100.031 Text en https://creativecommons.org/publicdomain/zero/1.0/ The Journal of Research of the National Institute of Standards and Technology is a publication of the U.S. Government. The papers are in the public domain and are not subject to copyright in the United States. Articles from J Res may contain photographs or illustrations copyrighted by other commercial organizations or individuals that may not be used without obtaining prior approval from the holder of the copyright.
spellingShingle Article
Hopkins, M. B.
Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell
title Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell
title_full Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell
title_fullStr Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell
title_full_unstemmed Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell
title_short Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell
title_sort langmuir probe measurements in the gaseous electronics conference rf reference cell
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4887235/
https://www.ncbi.nlm.nih.gov/pubmed/29151751
http://dx.doi.org/10.6028/jres.100.031
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