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Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell
The use of a Langmuir probe system in two GEC cells is reviewed. The major problems associated with probe diagnostics in a GEC cell are outlined and discussed. While the data base is still insufficient to give definitive values for many parameters, a number of standard measurements are put forward....
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
[Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology
1995
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Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4887235/ https://www.ncbi.nlm.nih.gov/pubmed/29151751 http://dx.doi.org/10.6028/jres.100.031 |
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author | Hopkins, M. B. |
author_facet | Hopkins, M. B. |
author_sort | Hopkins, M. B. |
collection | PubMed |
description | The use of a Langmuir probe system in two GEC cells is reviewed. The major problems associated with probe diagnostics in a GEC cell are outlined and discussed. While the data base is still insufficient to give definitive values for many parameters, a number of standard measurements are put forward. The plasma density in argon is 9×10(9) cm(−3) (±20 %) at an applied rf voltage of 250 V (500 V peak to peak) and a gas pressure of 13.3 Pa (100 mTorr). The electron density scales linearly with applied voltage. The plasma to ground sheath resistance is shown to be very important with a value of 810 Ω in argon at a pressure of 13.3 Pa (100 mTorr) and discharge current of 0.1 A. The value of plasma to ground resistance scales inversely with discharge current and sublinear with pressure. Two standard features in the electron energy distribution function (EEDF) have been proposed as a test of the ability of a probe system to resolve features, first, the transition from a low temperature (<1 eV) bi-Maxwellian distribution to a Druyveysten distribution (3 eV) at 13.3 Pa (100 mTorr) in argon, and the “hole” in the EEDF at 2 eV to 4 eV in nitrogen plasmas. |
format | Online Article Text |
id | pubmed-4887235 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 1995 |
publisher | [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology |
record_format | MEDLINE/PubMed |
spelling | pubmed-48872352017-11-17 Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell Hopkins, M. B. J Res Natl Inst Stand Technol Article The use of a Langmuir probe system in two GEC cells is reviewed. The major problems associated with probe diagnostics in a GEC cell are outlined and discussed. While the data base is still insufficient to give definitive values for many parameters, a number of standard measurements are put forward. The plasma density in argon is 9×10(9) cm(−3) (±20 %) at an applied rf voltage of 250 V (500 V peak to peak) and a gas pressure of 13.3 Pa (100 mTorr). The electron density scales linearly with applied voltage. The plasma to ground sheath resistance is shown to be very important with a value of 810 Ω in argon at a pressure of 13.3 Pa (100 mTorr) and discharge current of 0.1 A. The value of plasma to ground resistance scales inversely with discharge current and sublinear with pressure. Two standard features in the electron energy distribution function (EEDF) have been proposed as a test of the ability of a probe system to resolve features, first, the transition from a low temperature (<1 eV) bi-Maxwellian distribution to a Druyveysten distribution (3 eV) at 13.3 Pa (100 mTorr) in argon, and the “hole” in the EEDF at 2 eV to 4 eV in nitrogen plasmas. [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 1995 /pmc/articles/PMC4887235/ /pubmed/29151751 http://dx.doi.org/10.6028/jres.100.031 Text en https://creativecommons.org/publicdomain/zero/1.0/ The Journal of Research of the National Institute of Standards and Technology is a publication of the U.S. Government. The papers are in the public domain and are not subject to copyright in the United States. Articles from J Res may contain photographs or illustrations copyrighted by other commercial organizations or individuals that may not be used without obtaining prior approval from the holder of the copyright. |
spellingShingle | Article Hopkins, M. B. Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell |
title | Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell |
title_full | Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell |
title_fullStr | Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell |
title_full_unstemmed | Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell |
title_short | Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell |
title_sort | langmuir probe measurements in the gaseous electronics conference rf reference cell |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4887235/ https://www.ncbi.nlm.nih.gov/pubmed/29151751 http://dx.doi.org/10.6028/jres.100.031 |
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