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Band engineering in a van der Waals heterostructure using a 2D polar material and a capping layer
Van der Waals (vdW) heterostructures are expected to play a key role in next-generation electronic and optoelectronic devices. In this study, the band alignment of a vdW heterostructure with 2D polar materials was studied using first-principles calculations. As a model case study, single-sided fluor...
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2016
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4908394/ https://www.ncbi.nlm.nih.gov/pubmed/27301777 http://dx.doi.org/10.1038/srep27986 |
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author | Cho, Sung Beom Chung, Yong-Chae |
author_facet | Cho, Sung Beom Chung, Yong-Chae |
author_sort | Cho, Sung Beom |
collection | PubMed |
description | Van der Waals (vdW) heterostructures are expected to play a key role in next-generation electronic and optoelectronic devices. In this study, the band alignment of a vdW heterostructure with 2D polar materials was studied using first-principles calculations. As a model case study, single-sided fluorographene (a 2D polar material) on insulating (h-BN) and metallic (graphite) substrates was investigated to understand the band alignment behavior of polar materials. Single-sided fluorographene was found to have a potential difference along the out-of-plane direction. This potential difference provided as built-in potential at the interface, which shift the band alignment between h-BN and graphite. The interface characteristics were highly dependent on the interface terminations because of this built-in potential. Interestingly, this band alignment can be modified with a capping layer of graphene or BN because the capping layer triggered electronic reconstruction near the interface. This is because the bonding nature is not covalent, but van der Waals, which made it possible to avoid Fermi-level pinning at the interface. The results of this study showed that diverse types of band alignment can be achieved using polar materials and an appropriate capping layer. |
format | Online Article Text |
id | pubmed-4908394 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2016 |
publisher | Nature Publishing Group |
record_format | MEDLINE/PubMed |
spelling | pubmed-49083942016-06-15 Band engineering in a van der Waals heterostructure using a 2D polar material and a capping layer Cho, Sung Beom Chung, Yong-Chae Sci Rep Article Van der Waals (vdW) heterostructures are expected to play a key role in next-generation electronic and optoelectronic devices. In this study, the band alignment of a vdW heterostructure with 2D polar materials was studied using first-principles calculations. As a model case study, single-sided fluorographene (a 2D polar material) on insulating (h-BN) and metallic (graphite) substrates was investigated to understand the band alignment behavior of polar materials. Single-sided fluorographene was found to have a potential difference along the out-of-plane direction. This potential difference provided as built-in potential at the interface, which shift the band alignment between h-BN and graphite. The interface characteristics were highly dependent on the interface terminations because of this built-in potential. Interestingly, this band alignment can be modified with a capping layer of graphene or BN because the capping layer triggered electronic reconstruction near the interface. This is because the bonding nature is not covalent, but van der Waals, which made it possible to avoid Fermi-level pinning at the interface. The results of this study showed that diverse types of band alignment can be achieved using polar materials and an appropriate capping layer. Nature Publishing Group 2016-06-15 /pmc/articles/PMC4908394/ /pubmed/27301777 http://dx.doi.org/10.1038/srep27986 Text en Copyright © 2016, Macmillan Publishers Limited http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ |
spellingShingle | Article Cho, Sung Beom Chung, Yong-Chae Band engineering in a van der Waals heterostructure using a 2D polar material and a capping layer |
title | Band engineering in a van der Waals heterostructure using a 2D polar material and a capping layer |
title_full | Band engineering in a van der Waals heterostructure using a 2D polar material and a capping layer |
title_fullStr | Band engineering in a van der Waals heterostructure using a 2D polar material and a capping layer |
title_full_unstemmed | Band engineering in a van der Waals heterostructure using a 2D polar material and a capping layer |
title_short | Band engineering in a van der Waals heterostructure using a 2D polar material and a capping layer |
title_sort | band engineering in a van der waals heterostructure using a 2d polar material and a capping layer |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4908394/ https://www.ncbi.nlm.nih.gov/pubmed/27301777 http://dx.doi.org/10.1038/srep27986 |
work_keys_str_mv | AT chosungbeom bandengineeringinavanderwaalsheterostructureusinga2dpolarmaterialandacappinglayer AT chungyongchae bandengineeringinavanderwaalsheterostructureusinga2dpolarmaterialandacappinglayer |