Optical Calibration of a Submicrometer Magnification Standard

The calibration of a new submicrometer magnification standard for electron microscopes is described. The new standard is based on the width of a thin thermal-oxide film sandwiched between a silicon single-crystal substrate and a polysilicon capping layer. The calibration is based on an ellipsometric...

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Detalles Bibliográficos
Autores principales: Geist, Jon, Belzer, Barbara, Miller, Mary Lou, Roitman, Peter
Formato: Online Artículo Texto
Lenguaje:English
Publicado: [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 1992
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4914234/
https://www.ncbi.nlm.nih.gov/pubmed/28053432
http://dx.doi.org/10.6028/jres.097.008
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author Geist, Jon
Belzer, Barbara
Miller, Mary Lou
Roitman, Peter
author_facet Geist, Jon
Belzer, Barbara
Miller, Mary Lou
Roitman, Peter
author_sort Geist, Jon
collection PubMed
description The calibration of a new submicrometer magnification standard for electron microscopes is described. The new standard is based on the width of a thin thermal-oxide film sandwiched between a silicon single-crystal substrate and a polysilicon capping layer. The calibration is based on an ellipsometric measurement of the oxide thickness before the polysilicon layer is deposited on the oxide. The uncertainty in the derivation of a thickness for the layer from the ellipsometric parameters is also derived.
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spelling pubmed-49142342017-01-04 Optical Calibration of a Submicrometer Magnification Standard Geist, Jon Belzer, Barbara Miller, Mary Lou Roitman, Peter J Res Natl Inst Stand Technol Article The calibration of a new submicrometer magnification standard for electron microscopes is described. The new standard is based on the width of a thin thermal-oxide film sandwiched between a silicon single-crystal substrate and a polysilicon capping layer. The calibration is based on an ellipsometric measurement of the oxide thickness before the polysilicon layer is deposited on the oxide. The uncertainty in the derivation of a thickness for the layer from the ellipsometric parameters is also derived. [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 1992 /pmc/articles/PMC4914234/ /pubmed/28053432 http://dx.doi.org/10.6028/jres.097.008 Text en https://creativecommons.org/publicdomain/zero/1.0/ The Journal of Research of the National Institute of Standards and Technology is a publication of the U.S. Government. The papers are in the public domain and are not subject to copyright in the United States. Articles from J Res may contain photographs or illustrations copyrighted by other commercial organizations or individuals that may not be used without obtaining prior approval from the holder of the copyright.
spellingShingle Article
Geist, Jon
Belzer, Barbara
Miller, Mary Lou
Roitman, Peter
Optical Calibration of a Submicrometer Magnification Standard
title Optical Calibration of a Submicrometer Magnification Standard
title_full Optical Calibration of a Submicrometer Magnification Standard
title_fullStr Optical Calibration of a Submicrometer Magnification Standard
title_full_unstemmed Optical Calibration of a Submicrometer Magnification Standard
title_short Optical Calibration of a Submicrometer Magnification Standard
title_sort optical calibration of a submicrometer magnification standard
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4914234/
https://www.ncbi.nlm.nih.gov/pubmed/28053432
http://dx.doi.org/10.6028/jres.097.008
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