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A Self-Limiting Electro-Ablation Technique for the Top-Down Synthesis of Large-Area Monolayer Flakes of 2D Materials

We report the discovery of an electrochemical process that converts two dimensional layered materials of arbitrary thicknesses into monolayers. The lateral dimensions of the monolayers obtained by the process within a few seconds time at room temperature were as large as 0.5 mm. The temporal and spa...

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Autores principales: Das, Saptarshi, Bera, Mrinal K., Tong, Sheng, Narayanan, Badri, Kamath, Ganesh, Mane, Anil, Paulikas, Arvydas P., Antonio, Mark R., Sankaranarayanan, Subramanian K. R. S., Roelofs, Andreas K.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4915060/
https://www.ncbi.nlm.nih.gov/pubmed/27323877
http://dx.doi.org/10.1038/srep28195
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author Das, Saptarshi
Bera, Mrinal K.
Tong, Sheng
Narayanan, Badri
Kamath, Ganesh
Mane, Anil
Paulikas, Arvydas P.
Antonio, Mark R.
Sankaranarayanan, Subramanian K. R. S.
Roelofs, Andreas K.
author_facet Das, Saptarshi
Bera, Mrinal K.
Tong, Sheng
Narayanan, Badri
Kamath, Ganesh
Mane, Anil
Paulikas, Arvydas P.
Antonio, Mark R.
Sankaranarayanan, Subramanian K. R. S.
Roelofs, Andreas K.
author_sort Das, Saptarshi
collection PubMed
description We report the discovery of an electrochemical process that converts two dimensional layered materials of arbitrary thicknesses into monolayers. The lateral dimensions of the monolayers obtained by the process within a few seconds time at room temperature were as large as 0.5 mm. The temporal and spatial dynamics of this physical phenomenon, studied on MoS(2) flakes using ex-situ AFM imaging, Raman mapping, and photoluminescence measurements trace the origin of monolayer formation to a substrate-assisted self-limiting electrochemical ablation process. Electronic structure and atomistic calculations point to the interplay between three essential factors in the process: (1) strong covalent interaction of monolayer MoS(2) with the substrate; (2) electric-field induced differences in Gibbs free energy of exfoliation; (3) dispersion of MoS(2) in aqueous solution of hydrogen peroxide. This process was successful in obtaining monolayers of other 2D transition metal dichalcogenides, like WS(2) and MoTe(2) as well.
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spelling pubmed-49150602016-06-27 A Self-Limiting Electro-Ablation Technique for the Top-Down Synthesis of Large-Area Monolayer Flakes of 2D Materials Das, Saptarshi Bera, Mrinal K. Tong, Sheng Narayanan, Badri Kamath, Ganesh Mane, Anil Paulikas, Arvydas P. Antonio, Mark R. Sankaranarayanan, Subramanian K. R. S. Roelofs, Andreas K. Sci Rep Article We report the discovery of an electrochemical process that converts two dimensional layered materials of arbitrary thicknesses into monolayers. The lateral dimensions of the monolayers obtained by the process within a few seconds time at room temperature were as large as 0.5 mm. The temporal and spatial dynamics of this physical phenomenon, studied on MoS(2) flakes using ex-situ AFM imaging, Raman mapping, and photoluminescence measurements trace the origin of monolayer formation to a substrate-assisted self-limiting electrochemical ablation process. Electronic structure and atomistic calculations point to the interplay between three essential factors in the process: (1) strong covalent interaction of monolayer MoS(2) with the substrate; (2) electric-field induced differences in Gibbs free energy of exfoliation; (3) dispersion of MoS(2) in aqueous solution of hydrogen peroxide. This process was successful in obtaining monolayers of other 2D transition metal dichalcogenides, like WS(2) and MoTe(2) as well. Nature Publishing Group 2016-06-21 /pmc/articles/PMC4915060/ /pubmed/27323877 http://dx.doi.org/10.1038/srep28195 Text en Copyright © 2016, Macmillan Publishers Limited http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
spellingShingle Article
Das, Saptarshi
Bera, Mrinal K.
Tong, Sheng
Narayanan, Badri
Kamath, Ganesh
Mane, Anil
Paulikas, Arvydas P.
Antonio, Mark R.
Sankaranarayanan, Subramanian K. R. S.
Roelofs, Andreas K.
A Self-Limiting Electro-Ablation Technique for the Top-Down Synthesis of Large-Area Monolayer Flakes of 2D Materials
title A Self-Limiting Electro-Ablation Technique for the Top-Down Synthesis of Large-Area Monolayer Flakes of 2D Materials
title_full A Self-Limiting Electro-Ablation Technique for the Top-Down Synthesis of Large-Area Monolayer Flakes of 2D Materials
title_fullStr A Self-Limiting Electro-Ablation Technique for the Top-Down Synthesis of Large-Area Monolayer Flakes of 2D Materials
title_full_unstemmed A Self-Limiting Electro-Ablation Technique for the Top-Down Synthesis of Large-Area Monolayer Flakes of 2D Materials
title_short A Self-Limiting Electro-Ablation Technique for the Top-Down Synthesis of Large-Area Monolayer Flakes of 2D Materials
title_sort self-limiting electro-ablation technique for the top-down synthesis of large-area monolayer flakes of 2d materials
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4915060/
https://www.ncbi.nlm.nih.gov/pubmed/27323877
http://dx.doi.org/10.1038/srep28195
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