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Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications Part II. Interpreting Oxide-Bias Experiments
The semiconductor device modeling program PC-1D and the programs that support its use in high-accuracy modeling of photodiodes, all of which were described in Part I of this series of papers, are used to simulate oxide-bias self-calibration experiments on three different types of silicon photodiodes...
Autores principales: | , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
[Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology
1991
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4930053/ https://www.ncbi.nlm.nih.gov/pubmed/28184123 http://dx.doi.org/10.6028/jres.096.024 |
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author | Geist, Jon Köhler, Rainer Goebel, Roland Robinson, A. M. James, C. R. |
author_facet | Geist, Jon Köhler, Rainer Goebel, Roland Robinson, A. M. James, C. R. |
author_sort | Geist, Jon |
collection | PubMed |
description | The semiconductor device modeling program PC-1D and the programs that support its use in high-accuracy modeling of photodiodes, all of which were described in Part I of this series of papers, are used to simulate oxide-bias self-calibration experiments on three different types of silicon photodiodes. It is shown that these simulations can be used to determine photodiode characteristics, including the internal quantum efficiency for the different types of photodiodes. In the latter case, the simulations provide more accurate values than can be determined by using the conventional data reduction procedure, and an uncertainty estimate can be derived. Finally, it is shown that 0.9997 ± 0.0003 is a nominal value for the internal quantum efficiency of one type of photodiode over the 440 to 460 nm spectral region. |
format | Online Article Text |
id | pubmed-4930053 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 1991 |
publisher | [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology |
record_format | MEDLINE/PubMed |
spelling | pubmed-49300532017-02-09 Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications Part II. Interpreting Oxide-Bias Experiments Geist, Jon Köhler, Rainer Goebel, Roland Robinson, A. M. James, C. R. J Res Natl Inst Stand Technol Article The semiconductor device modeling program PC-1D and the programs that support its use in high-accuracy modeling of photodiodes, all of which were described in Part I of this series of papers, are used to simulate oxide-bias self-calibration experiments on three different types of silicon photodiodes. It is shown that these simulations can be used to determine photodiode characteristics, including the internal quantum efficiency for the different types of photodiodes. In the latter case, the simulations provide more accurate values than can be determined by using the conventional data reduction procedure, and an uncertainty estimate can be derived. Finally, it is shown that 0.9997 ± 0.0003 is a nominal value for the internal quantum efficiency of one type of photodiode over the 440 to 460 nm spectral region. [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 1991 /pmc/articles/PMC4930053/ /pubmed/28184123 http://dx.doi.org/10.6028/jres.096.024 Text en https://creativecommons.org/publicdomain/zero/1.0/ The Journal of Research of the National Institute of Standards and Technology is a publication of the U.S. Government. The papers are in the public domain and are not subject to copyright in the United States. Articles from J Res may contain photographs or illustrations copyrighted by other commercial organizations or individuals that may not be used without obtaining prior approval from the holder of the copyright. |
spellingShingle | Article Geist, Jon Köhler, Rainer Goebel, Roland Robinson, A. M. James, C. R. Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications Part II. Interpreting Oxide-Bias Experiments |
title | Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications Part II. Interpreting Oxide-Bias Experiments |
title_full | Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications Part II. Interpreting Oxide-Bias Experiments |
title_fullStr | Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications Part II. Interpreting Oxide-Bias Experiments |
title_full_unstemmed | Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications Part II. Interpreting Oxide-Bias Experiments |
title_short | Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications Part II. Interpreting Oxide-Bias Experiments |
title_sort | numerical modeling of silicon photodiodes for high-accuracy applications part ii. interpreting oxide-bias experiments |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4930053/ https://www.ncbi.nlm.nih.gov/pubmed/28184123 http://dx.doi.org/10.6028/jres.096.024 |
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