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Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications Part II. Interpreting Oxide-Bias Experiments

The semiconductor device modeling program PC-1D and the programs that support its use in high-accuracy modeling of photodiodes, all of which were described in Part I of this series of papers, are used to simulate oxide-bias self-calibration experiments on three different types of silicon photodiodes...

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Detalles Bibliográficos
Autores principales: Geist, Jon, Köhler, Rainer, Goebel, Roland, Robinson, A. M., James, C. R.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 1991
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4930053/
https://www.ncbi.nlm.nih.gov/pubmed/28184123
http://dx.doi.org/10.6028/jres.096.024
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author Geist, Jon
Köhler, Rainer
Goebel, Roland
Robinson, A. M.
James, C. R.
author_facet Geist, Jon
Köhler, Rainer
Goebel, Roland
Robinson, A. M.
James, C. R.
author_sort Geist, Jon
collection PubMed
description The semiconductor device modeling program PC-1D and the programs that support its use in high-accuracy modeling of photodiodes, all of which were described in Part I of this series of papers, are used to simulate oxide-bias self-calibration experiments on three different types of silicon photodiodes. It is shown that these simulations can be used to determine photodiode characteristics, including the internal quantum efficiency for the different types of photodiodes. In the latter case, the simulations provide more accurate values than can be determined by using the conventional data reduction procedure, and an uncertainty estimate can be derived. Finally, it is shown that 0.9997 ± 0.0003 is a nominal value for the internal quantum efficiency of one type of photodiode over the 440 to 460 nm spectral region.
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spelling pubmed-49300532017-02-09 Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications Part II. Interpreting Oxide-Bias Experiments Geist, Jon Köhler, Rainer Goebel, Roland Robinson, A. M. James, C. R. J Res Natl Inst Stand Technol Article The semiconductor device modeling program PC-1D and the programs that support its use in high-accuracy modeling of photodiodes, all of which were described in Part I of this series of papers, are used to simulate oxide-bias self-calibration experiments on three different types of silicon photodiodes. It is shown that these simulations can be used to determine photodiode characteristics, including the internal quantum efficiency for the different types of photodiodes. In the latter case, the simulations provide more accurate values than can be determined by using the conventional data reduction procedure, and an uncertainty estimate can be derived. Finally, it is shown that 0.9997 ± 0.0003 is a nominal value for the internal quantum efficiency of one type of photodiode over the 440 to 460 nm spectral region. [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 1991 /pmc/articles/PMC4930053/ /pubmed/28184123 http://dx.doi.org/10.6028/jres.096.024 Text en https://creativecommons.org/publicdomain/zero/1.0/ The Journal of Research of the National Institute of Standards and Technology is a publication of the U.S. Government. The papers are in the public domain and are not subject to copyright in the United States. Articles from J Res may contain photographs or illustrations copyrighted by other commercial organizations or individuals that may not be used without obtaining prior approval from the holder of the copyright.
spellingShingle Article
Geist, Jon
Köhler, Rainer
Goebel, Roland
Robinson, A. M.
James, C. R.
Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications Part II. Interpreting Oxide-Bias Experiments
title Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications Part II. Interpreting Oxide-Bias Experiments
title_full Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications Part II. Interpreting Oxide-Bias Experiments
title_fullStr Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications Part II. Interpreting Oxide-Bias Experiments
title_full_unstemmed Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications Part II. Interpreting Oxide-Bias Experiments
title_short Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications Part II. Interpreting Oxide-Bias Experiments
title_sort numerical modeling of silicon photodiodes for high-accuracy applications part ii. interpreting oxide-bias experiments
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4930053/
https://www.ncbi.nlm.nih.gov/pubmed/28184123
http://dx.doi.org/10.6028/jres.096.024
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