Perfluorodecyltrichlorosilane-based seed-layer for improved chemical vapour deposition of ultrathin hafnium dioxide films on graphene

We investigate the use of perfluorodecyltrichlorosilane-based self-assembled monolayer as seeding layer for chemical vapour deposition of HfO(2) on large area CVD graphene. The deposition and evolution of the FDTS-based seed layer is investigated by X-ray photoelectron spectroscopy, Auger electron s...

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Detalles Bibliográficos
Autores principales: Kitzmann, Julia, Göritz, Alexander, Fraschke, Mirko, Lukosius, Mindaugas, Wenger, Christian, Wolff, Andre, Lupina, Grzegorz
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4933886/
https://www.ncbi.nlm.nih.gov/pubmed/27381715
http://dx.doi.org/10.1038/srep29223

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4933886/
https://www.ncbi.nlm.nih.gov/pubmed/27381715
http://dx.doi.org/10.1038/srep29223

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