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Influence of Thickness on the Electrical Transport Properties of Exfoliated Bi(2)Te(3) Ultrathin Films

In this work, the mechanical exfoliation method has been utilized to fabricate Bi(2)Te(3) ultrathin films. The thickness of the ultrathin films is revealed to be several tens of nanometers. Weak antilocalization effects and Shubnikov de Haas oscillations have been observed in the magneto-transport m...

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Detalles Bibliográficos
Autores principales: Mo, D. L., Wang, W. B., Cai, Q.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2016
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4970989/
https://www.ncbi.nlm.nih.gov/pubmed/27484860
http://dx.doi.org/10.1186/s11671-016-1566-7
Descripción
Sumario:In this work, the mechanical exfoliation method has been utilized to fabricate Bi(2)Te(3) ultrathin films. The thickness of the ultrathin films is revealed to be several tens of nanometers. Weak antilocalization effects and Shubnikov de Haas oscillations have been observed in the magneto-transport measurements on individual films with different thickness, and the two-dimensional surface conduction plays a dominant role. The Fermi level is found to be 81 meV above the Dirac point, and the carrier mobility can reach ~6030 cm(2)/(Vs) for the 10-nm film. When the film thickness decreases from 30 to 10 nm, the Fermi level will move 8 meV far from the bulk valence band. The coefficient α in the Hikami-Larkin-Nagaoka equation is shown to be ~0.5, manifesting that only the bottom surface of the Bi(2)Te(3) ultrathin films takes part in transport conductions. These will pave the way for understanding thoroughly the surface transport properties of topological insulators.