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Optimizing Silicon Oxide Embedded Silicon Nanocrystal Inter-particle Distances
We demonstrate an analytical method to optimize the stoichiometry and thickness of multilayer silicon oxide films in order to achieve the highest density of non-touching and closely spaced silicon nanocrystals after annealing. The probability of a nanocrystal nearest-neighbor distance within a limit...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer US
2016
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4974215/ https://www.ncbi.nlm.nih.gov/pubmed/27492439 http://dx.doi.org/10.1186/s11671-016-1567-6 |