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Controlled creation and displacement of charged domain walls in ferroelectric thin films
Charged domain walls in ferroelectric materials are of high interest due to their potential use in nanoelectronic devices. While previous approaches have utilized complex scanning probe techniques or frustrative poling here we show the creation of charged domain walls in ferroelectric thin films dur...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2016
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4979207/ https://www.ncbi.nlm.nih.gov/pubmed/27507433 http://dx.doi.org/10.1038/srep31323 |
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author | Feigl, L. Sluka, T. McGilly, L. J. Crassous, A. Sandu, C. S. Setter, N. |
author_facet | Feigl, L. Sluka, T. McGilly, L. J. Crassous, A. Sandu, C. S. Setter, N. |
author_sort | Feigl, L. |
collection | PubMed |
description | Charged domain walls in ferroelectric materials are of high interest due to their potential use in nanoelectronic devices. While previous approaches have utilized complex scanning probe techniques or frustrative poling here we show the creation of charged domain walls in ferroelectric thin films during simple polarization switching using either a conductive probe tip or patterned top electrodes. We demonstrate that ferroelectric switching is accompanied - without exception - by the appearance of charged domain walls and that these walls can be displaced and erased reliably. We ascertain from a combination of scanning probe microscopy, transmission electron microscopy and phase field simulations that creation of charged domain walls is a by-product of, and as such is always coupled to, ferroelectric switching. This is due to the (110) orientation of the tetragonal (Pb,Sr)TiO(3) thin films and the crucial role played by the limited conduction of the LSMO bottom electrode layer used in this study. This work highlights that charged domain walls, far from being exotic, unstable structures, as might have been assumed previously, can be robust, stable easily-controlled features in ferroelectric thin films. |
format | Online Article Text |
id | pubmed-4979207 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2016 |
publisher | Nature Publishing Group |
record_format | MEDLINE/PubMed |
spelling | pubmed-49792072016-08-19 Controlled creation and displacement of charged domain walls in ferroelectric thin films Feigl, L. Sluka, T. McGilly, L. J. Crassous, A. Sandu, C. S. Setter, N. Sci Rep Article Charged domain walls in ferroelectric materials are of high interest due to their potential use in nanoelectronic devices. While previous approaches have utilized complex scanning probe techniques or frustrative poling here we show the creation of charged domain walls in ferroelectric thin films during simple polarization switching using either a conductive probe tip or patterned top electrodes. We demonstrate that ferroelectric switching is accompanied - without exception - by the appearance of charged domain walls and that these walls can be displaced and erased reliably. We ascertain from a combination of scanning probe microscopy, transmission electron microscopy and phase field simulations that creation of charged domain walls is a by-product of, and as such is always coupled to, ferroelectric switching. This is due to the (110) orientation of the tetragonal (Pb,Sr)TiO(3) thin films and the crucial role played by the limited conduction of the LSMO bottom electrode layer used in this study. This work highlights that charged domain walls, far from being exotic, unstable structures, as might have been assumed previously, can be robust, stable easily-controlled features in ferroelectric thin films. Nature Publishing Group 2016-08-10 /pmc/articles/PMC4979207/ /pubmed/27507433 http://dx.doi.org/10.1038/srep31323 Text en Copyright © 2016, The Author(s) http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ |
spellingShingle | Article Feigl, L. Sluka, T. McGilly, L. J. Crassous, A. Sandu, C. S. Setter, N. Controlled creation and displacement of charged domain walls in ferroelectric thin films |
title | Controlled creation and displacement of charged domain walls in ferroelectric thin films |
title_full | Controlled creation and displacement of charged domain walls in ferroelectric thin films |
title_fullStr | Controlled creation and displacement of charged domain walls in ferroelectric thin films |
title_full_unstemmed | Controlled creation and displacement of charged domain walls in ferroelectric thin films |
title_short | Controlled creation and displacement of charged domain walls in ferroelectric thin films |
title_sort | controlled creation and displacement of charged domain walls in ferroelectric thin films |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4979207/ https://www.ncbi.nlm.nih.gov/pubmed/27507433 http://dx.doi.org/10.1038/srep31323 |
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