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Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor
Autores principales: | , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2016
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5009879/ https://www.ncbi.nlm.nih.gov/pubmed/27589371 http://dx.doi.org/10.1038/srep31300 |
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author | Park, Jae Hyo Kim, Hyung Yoon Jang, Gil Su Seok, Ki Hwan Chae, Hee Jae Lee, Sol Kyu Kiaee, Zohreh Joo, Seung Ki |
author_facet | Park, Jae Hyo Kim, Hyung Yoon Jang, Gil Su Seok, Ki Hwan Chae, Hee Jae Lee, Sol Kyu Kiaee, Zohreh Joo, Seung Ki |
author_sort | Park, Jae Hyo |
collection | PubMed |
description | |
format | Online Article Text |
id | pubmed-5009879 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2016 |
publisher | Nature Publishing Group |
record_format | MEDLINE/PubMed |
spelling | pubmed-50098792016-09-12 Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor Park, Jae Hyo Kim, Hyung Yoon Jang, Gil Su Seok, Ki Hwan Chae, Hee Jae Lee, Sol Kyu Kiaee, Zohreh Joo, Seung Ki Sci Rep Retraction Nature Publishing Group 2016-09-02 /pmc/articles/PMC5009879/ /pubmed/27589371 http://dx.doi.org/10.1038/srep31300 Text en Copyright © 2016, The Author(s) http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ |
spellingShingle | Retraction Park, Jae Hyo Kim, Hyung Yoon Jang, Gil Su Seok, Ki Hwan Chae, Hee Jae Lee, Sol Kyu Kiaee, Zohreh Joo, Seung Ki Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor |
title | Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor |
title_full | Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor |
title_fullStr | Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor |
title_full_unstemmed | Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor |
title_short | Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor |
title_sort | retraction: integrating epitaxial-like pb(zr,ti)o(3) thin-film into silicon for next-generation ferroelectric field-effect transistor |
topic | Retraction |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5009879/ https://www.ncbi.nlm.nih.gov/pubmed/27589371 http://dx.doi.org/10.1038/srep31300 |
work_keys_str_mv | AT parkjaehyo retractionintegratingepitaxiallikepbzrtio3thinfilmintosiliconfornextgenerationferroelectricfieldeffecttransistor AT kimhyungyoon retractionintegratingepitaxiallikepbzrtio3thinfilmintosiliconfornextgenerationferroelectricfieldeffecttransistor AT janggilsu retractionintegratingepitaxiallikepbzrtio3thinfilmintosiliconfornextgenerationferroelectricfieldeffecttransistor AT seokkihwan retractionintegratingepitaxiallikepbzrtio3thinfilmintosiliconfornextgenerationferroelectricfieldeffecttransistor AT chaeheejae retractionintegratingepitaxiallikepbzrtio3thinfilmintosiliconfornextgenerationferroelectricfieldeffecttransistor AT leesolkyu retractionintegratingepitaxiallikepbzrtio3thinfilmintosiliconfornextgenerationferroelectricfieldeffecttransistor AT kiaeezohreh retractionintegratingepitaxiallikepbzrtio3thinfilmintosiliconfornextgenerationferroelectricfieldeffecttransistor AT jooseungki retractionintegratingepitaxiallikepbzrtio3thinfilmintosiliconfornextgenerationferroelectricfieldeffecttransistor |