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Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor

Detalles Bibliográficos
Autores principales: Park, Jae Hyo, Kim, Hyung Yoon, Jang, Gil Su, Seok, Ki Hwan, Chae, Hee Jae, Lee, Sol Kyu, Kiaee, Zohreh, Joo, Seung Ki
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5009879/
https://www.ncbi.nlm.nih.gov/pubmed/27589371
http://dx.doi.org/10.1038/srep31300
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author Park, Jae Hyo
Kim, Hyung Yoon
Jang, Gil Su
Seok, Ki Hwan
Chae, Hee Jae
Lee, Sol Kyu
Kiaee, Zohreh
Joo, Seung Ki
author_facet Park, Jae Hyo
Kim, Hyung Yoon
Jang, Gil Su
Seok, Ki Hwan
Chae, Hee Jae
Lee, Sol Kyu
Kiaee, Zohreh
Joo, Seung Ki
author_sort Park, Jae Hyo
collection PubMed
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spelling pubmed-50098792016-09-12 Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor Park, Jae Hyo Kim, Hyung Yoon Jang, Gil Su Seok, Ki Hwan Chae, Hee Jae Lee, Sol Kyu Kiaee, Zohreh Joo, Seung Ki Sci Rep Retraction Nature Publishing Group 2016-09-02 /pmc/articles/PMC5009879/ /pubmed/27589371 http://dx.doi.org/10.1038/srep31300 Text en Copyright © 2016, The Author(s) http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
spellingShingle Retraction
Park, Jae Hyo
Kim, Hyung Yoon
Jang, Gil Su
Seok, Ki Hwan
Chae, Hee Jae
Lee, Sol Kyu
Kiaee, Zohreh
Joo, Seung Ki
Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor
title Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor
title_full Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor
title_fullStr Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor
title_full_unstemmed Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor
title_short Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor
title_sort retraction: integrating epitaxial-like pb(zr,ti)o(3) thin-film into silicon for next-generation ferroelectric field-effect transistor
topic Retraction
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5009879/
https://www.ncbi.nlm.nih.gov/pubmed/27589371
http://dx.doi.org/10.1038/srep31300
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