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Retraction: Integrating Epitaxial-Like Pb(Zr,Ti)O(3) Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor

Detalles Bibliográficos
Autores principales:	Park, Jae Hyo, Kim, Hyung Yoon, Jang, Gil Su, Seok, Ki Hwan, Chae, Hee Jae, Lee, Sol Kyu, Kiaee, Zohreh, Joo, Seung Ki
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Nature Publishing Group 2016
Materias:	Retraction
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5009879/ https://www.ncbi.nlm.nih.gov/pubmed/27589371 http://dx.doi.org/10.1038/srep31300

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