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Role of Arsenic During Aluminum Droplet Etching of Nanoholes in AlGaAs
Self-assembled nanoholes are drilled into (001) AlGaAs surfaces during molecular beam epitaxy (MBE) using local droplet etching (LDE) with Al droplets. It is known that this process requires a small amount of background arsenic for droplet material removal. The present work demonstrates that the As...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer US
2016
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5037105/ https://www.ncbi.nlm.nih.gov/pubmed/27671015 http://dx.doi.org/10.1186/s11671-016-1648-6 |
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author | Heyn, Christian Zocher, Michel Schnüll, Sandra Hansen, Wolfgang |
author_facet | Heyn, Christian Zocher, Michel Schnüll, Sandra Hansen, Wolfgang |
author_sort | Heyn, Christian |
collection | PubMed |
description | Self-assembled nanoholes are drilled into (001) AlGaAs surfaces during molecular beam epitaxy (MBE) using local droplet etching (LDE) with Al droplets. It is known that this process requires a small amount of background arsenic for droplet material removal. The present work demonstrates that the As background can be supplied by both a small As flux to the surface as well as by the topmost As layer in an As-terminated surface reconstruction acting as a reservoir. We study the temperature-dependent evaporation of the As topmost layer with in situ electron diffraction and determine an activation energy of 2.49 eV. After thermal removal of the As topmost layer droplet etching is studied under well-defined As supply. We observe with decreasing As flux four regimes: planar growth, uniform nanoholes, non-uniform holes, and droplet conservation. The influence of the As supply is discussed quantitatively on the basis of a kinetic rate model. |
format | Online Article Text |
id | pubmed-5037105 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2016 |
publisher | Springer US |
record_format | MEDLINE/PubMed |
spelling | pubmed-50371052016-10-03 Role of Arsenic During Aluminum Droplet Etching of Nanoholes in AlGaAs Heyn, Christian Zocher, Michel Schnüll, Sandra Hansen, Wolfgang Nanoscale Res Lett Nano Express Self-assembled nanoholes are drilled into (001) AlGaAs surfaces during molecular beam epitaxy (MBE) using local droplet etching (LDE) with Al droplets. It is known that this process requires a small amount of background arsenic for droplet material removal. The present work demonstrates that the As background can be supplied by both a small As flux to the surface as well as by the topmost As layer in an As-terminated surface reconstruction acting as a reservoir. We study the temperature-dependent evaporation of the As topmost layer with in situ electron diffraction and determine an activation energy of 2.49 eV. After thermal removal of the As topmost layer droplet etching is studied under well-defined As supply. We observe with decreasing As flux four regimes: planar growth, uniform nanoholes, non-uniform holes, and droplet conservation. The influence of the As supply is discussed quantitatively on the basis of a kinetic rate model. Springer US 2016-09-26 /pmc/articles/PMC5037105/ /pubmed/27671015 http://dx.doi.org/10.1186/s11671-016-1648-6 Text en © The Author(s) 2016 Open Access This article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. |
spellingShingle | Nano Express Heyn, Christian Zocher, Michel Schnüll, Sandra Hansen, Wolfgang Role of Arsenic During Aluminum Droplet Etching of Nanoholes in AlGaAs |
title | Role of Arsenic During Aluminum Droplet Etching of Nanoholes in AlGaAs |
title_full | Role of Arsenic During Aluminum Droplet Etching of Nanoholes in AlGaAs |
title_fullStr | Role of Arsenic During Aluminum Droplet Etching of Nanoholes in AlGaAs |
title_full_unstemmed | Role of Arsenic During Aluminum Droplet Etching of Nanoholes in AlGaAs |
title_short | Role of Arsenic During Aluminum Droplet Etching of Nanoholes in AlGaAs |
title_sort | role of arsenic during aluminum droplet etching of nanoholes in algaas |
topic | Nano Express |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5037105/ https://www.ncbi.nlm.nih.gov/pubmed/27671015 http://dx.doi.org/10.1186/s11671-016-1648-6 |
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