Role of Arsenic During Aluminum Droplet Etching of Nanoholes in AlGaAs

Self-assembled nanoholes are drilled into (001) AlGaAs surfaces during molecular beam epitaxy (MBE) using local droplet etching (LDE) with Al droplets. It is known that this process requires a small amount of background arsenic for droplet material removal. The present work demonstrates that the As...

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Detalles Bibliográficos
Autores principales: Heyn, Christian, Zocher, Michel, Schnüll, Sandra, Hansen, Wolfgang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2016
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5037105/
https://www.ncbi.nlm.nih.gov/pubmed/27671015
http://dx.doi.org/10.1186/s11671-016-1648-6

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5037105/
https://www.ncbi.nlm.nih.gov/pubmed/27671015
http://dx.doi.org/10.1186/s11671-016-1648-6

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