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Surface step terrace tuned microstructures and dielectric properties of highly epitaxial CaCu(3)Ti(4)O(12) thin films on vicinal LaAlO(3) substrates
Controllable interfacial strain can manipulate the physical properties of epitaxial films and help understand the physical nature of the correlation between the properties and the atomic microstructures. By using a proper design of vicinal single-crystal substrate, the interface strain in epitaxial...
Autores principales: | , , , , , , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2016
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5050425/ https://www.ncbi.nlm.nih.gov/pubmed/27703253 http://dx.doi.org/10.1038/srep34683 |
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author | Yao, Guang Gao, Min Ji, Yanda Liang, Weizheng Gao, Lei Zheng, Shengliang Wang, You Pang, Bin Chen, Y. B. Zeng, Huizhong Li, Handong Wang, Zhiming Liu, Jingsong Chen, Chonglin Lin, Yuan |
author_facet | Yao, Guang Gao, Min Ji, Yanda Liang, Weizheng Gao, Lei Zheng, Shengliang Wang, You Pang, Bin Chen, Y. B. Zeng, Huizhong Li, Handong Wang, Zhiming Liu, Jingsong Chen, Chonglin Lin, Yuan |
author_sort | Yao, Guang |
collection | PubMed |
description | Controllable interfacial strain can manipulate the physical properties of epitaxial films and help understand the physical nature of the correlation between the properties and the atomic microstructures. By using a proper design of vicinal single-crystal substrate, the interface strain in epitaxial thin films can be well controlled by adjusting the miscut angle via a surface-step-terrace matching growth mode. Here, we demonstrate that LaAlO(3) (LAO) substrates with various miscut angles of 1.0°, 2.75°, and 5.0° were used to tune the dielectric properties of epitaxial CaCu(3)Ti(4)O(12) (CCTO) thin films. A model of coexistent compressive and tensile strained domains is proposed to understand the epitaxial nature. Our findings on the self-tuning of the compressive and tensile strained domain ratio along the interface depending on the miscut angle and the stress relaxation mechanism under this growth mode will open a new avenue to achieve CCTO films with high dielectric constant and low dielectric loss, which is critical for the design and integration of advanced heterostructures for high performance capacitance device applications. |
format | Online Article Text |
id | pubmed-5050425 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2016 |
publisher | Nature Publishing Group |
record_format | MEDLINE/PubMed |
spelling | pubmed-50504252016-10-11 Surface step terrace tuned microstructures and dielectric properties of highly epitaxial CaCu(3)Ti(4)O(12) thin films on vicinal LaAlO(3) substrates Yao, Guang Gao, Min Ji, Yanda Liang, Weizheng Gao, Lei Zheng, Shengliang Wang, You Pang, Bin Chen, Y. B. Zeng, Huizhong Li, Handong Wang, Zhiming Liu, Jingsong Chen, Chonglin Lin, Yuan Sci Rep Article Controllable interfacial strain can manipulate the physical properties of epitaxial films and help understand the physical nature of the correlation between the properties and the atomic microstructures. By using a proper design of vicinal single-crystal substrate, the interface strain in epitaxial thin films can be well controlled by adjusting the miscut angle via a surface-step-terrace matching growth mode. Here, we demonstrate that LaAlO(3) (LAO) substrates with various miscut angles of 1.0°, 2.75°, and 5.0° were used to tune the dielectric properties of epitaxial CaCu(3)Ti(4)O(12) (CCTO) thin films. A model of coexistent compressive and tensile strained domains is proposed to understand the epitaxial nature. Our findings on the self-tuning of the compressive and tensile strained domain ratio along the interface depending on the miscut angle and the stress relaxation mechanism under this growth mode will open a new avenue to achieve CCTO films with high dielectric constant and low dielectric loss, which is critical for the design and integration of advanced heterostructures for high performance capacitance device applications. Nature Publishing Group 2016-10-05 /pmc/articles/PMC5050425/ /pubmed/27703253 http://dx.doi.org/10.1038/srep34683 Text en Copyright © 2016, The Author(s) http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ |
spellingShingle | Article Yao, Guang Gao, Min Ji, Yanda Liang, Weizheng Gao, Lei Zheng, Shengliang Wang, You Pang, Bin Chen, Y. B. Zeng, Huizhong Li, Handong Wang, Zhiming Liu, Jingsong Chen, Chonglin Lin, Yuan Surface step terrace tuned microstructures and dielectric properties of highly epitaxial CaCu(3)Ti(4)O(12) thin films on vicinal LaAlO(3) substrates |
title | Surface step terrace tuned microstructures and dielectric properties of highly epitaxial CaCu(3)Ti(4)O(12) thin films on vicinal LaAlO(3) substrates |
title_full | Surface step terrace tuned microstructures and dielectric properties of highly epitaxial CaCu(3)Ti(4)O(12) thin films on vicinal LaAlO(3) substrates |
title_fullStr | Surface step terrace tuned microstructures and dielectric properties of highly epitaxial CaCu(3)Ti(4)O(12) thin films on vicinal LaAlO(3) substrates |
title_full_unstemmed | Surface step terrace tuned microstructures and dielectric properties of highly epitaxial CaCu(3)Ti(4)O(12) thin films on vicinal LaAlO(3) substrates |
title_short | Surface step terrace tuned microstructures and dielectric properties of highly epitaxial CaCu(3)Ti(4)O(12) thin films on vicinal LaAlO(3) substrates |
title_sort | surface step terrace tuned microstructures and dielectric properties of highly epitaxial cacu(3)ti(4)o(12) thin films on vicinal laalo(3) substrates |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5050425/ https://www.ncbi.nlm.nih.gov/pubmed/27703253 http://dx.doi.org/10.1038/srep34683 |
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