High-quality AlN epitaxy on nano-patterned sapphire substrates prepared by nano-imprint lithography

We report epitaxial growth of AlN films with atomically flat surface on nano-patterned sapphire substrates (NPSS) prepared by nano-imprint lithography. The crystalline quality can be greatly improved by using the optimized 1-μm-period NPSS. The X-ray diffraction ω-scan full width at half maximum val...

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Detalles Bibliográficos
Autores principales: Zhang, Lisheng, Xu, Fujun, Wang, Jiaming, He, Chenguang, Guo, Weiwei, Wang, Mingxing, Sheng, Bowen, Lu, Lin, Qin, Zhixin, Wang, Xinqiang, Shen, Bo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5095705/
https://www.ncbi.nlm.nih.gov/pubmed/27812006
http://dx.doi.org/10.1038/srep35934

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5095705/
https://www.ncbi.nlm.nih.gov/pubmed/27812006
http://dx.doi.org/10.1038/srep35934

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