High‐Throughput Contact Flow Lithography

High‐throughput fabrication of graphically encoded hydrogel microparticles is achieved by combining flow contact lithography in a multichannel microfluidic device and a high capacity 25 mm LED UV source. Production rates of chemically homogeneous particles are improved by two orders of magnitude. Ad...

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Detalles Bibliográficos
Autores principales: Le Goff, Gaelle C., Lee, Jiseok, Gupta, Ankur, Hill, William Adam, Doyle, Patrick S.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2015
Materias:
Communications
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5115321/
https://www.ncbi.nlm.nih.gov/pubmed/27980910
http://dx.doi.org/10.1002/advs.201500149
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author Le Goff, Gaelle C.
Lee, Jiseok
Gupta, Ankur
Hill, William Adam
Doyle, Patrick S.
author_facet Le Goff, Gaelle C.
Lee, Jiseok
Gupta, Ankur
Hill, William Adam
Doyle, Patrick S.
author_sort Le Goff, Gaelle C.
collection PubMed
description High‐throughput fabrication of graphically encoded hydrogel microparticles is achieved by combining flow contact lithography in a multichannel microfluidic device and a high capacity 25 mm LED UV source. Production rates of chemically homogeneous particles are improved by two orders of magnitude. Additionally, the custom‐built contact lithography instrument provides an affordable solution for patterning complex microstructures on surfaces. [Image: see text]
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spelling pubmed-51153212016-12-15 High‐Throughput Contact Flow Lithography Le Goff, Gaelle C. Lee, Jiseok Gupta, Ankur Hill, William Adam Doyle, Patrick S. Adv Sci (Weinh) Communications High‐throughput fabrication of graphically encoded hydrogel microparticles is achieved by combining flow contact lithography in a multichannel microfluidic device and a high capacity 25 mm LED UV source. Production rates of chemically homogeneous particles are improved by two orders of magnitude. Additionally, the custom‐built contact lithography instrument provides an affordable solution for patterning complex microstructures on surfaces. [Image: see text] John Wiley and Sons Inc. 2015-06-24 /pmc/articles/PMC5115321/ /pubmed/27980910 http://dx.doi.org/10.1002/advs.201500149 Text en © 2015 The Authors. Published by WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim This is an open access article under the terms of the Creative Commons Attribution (http://creativecommons.org/licenses/by/4.0/) License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.
spellingShingle Communications
Le Goff, Gaelle C.
Lee, Jiseok
Gupta, Ankur
Hill, William Adam
Doyle, Patrick S.
High‐Throughput Contact Flow Lithography
title High‐Throughput Contact Flow Lithography
title_full High‐Throughput Contact Flow Lithography
title_fullStr High‐Throughput Contact Flow Lithography
title_full_unstemmed High‐Throughput Contact Flow Lithography
title_short High‐Throughput Contact Flow Lithography
title_sort high‐throughput contact flow lithography
topic Communications
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5115321/
https://www.ncbi.nlm.nih.gov/pubmed/27980910
http://dx.doi.org/10.1002/advs.201500149
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