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Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)
A parallel nanolithographic patterning method is presented by P. Fischer and co‐workers in article number 1500016 that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic i...
Autores principales: | , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
John Wiley and Sons Inc.
2015
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5115437/ http://dx.doi.org/10.1002/advs.201570022 |
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author | Jeong, Hyeon‐Ho Mark, Andrew G. Lee, Tung‐Chun Son, Kwanghyo Chen, Wenwen Alarcón‐Correa, Mariana Kim, Insook Schütz, Gisela Fischer, Peer |
author_facet | Jeong, Hyeon‐Ho Mark, Andrew G. Lee, Tung‐Chun Son, Kwanghyo Chen, Wenwen Alarcón‐Correa, Mariana Kim, Insook Schütz, Gisela Fischer, Peer |
author_sort | Jeong, Hyeon‐Ho |
collection | PubMed |
description | A parallel nanolithographic patterning method is presented by P. Fischer and co‐workers in article number 1500016 that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch‐mask applications. Image by Alejandro Posada Boada. [Image: see text] |
format | Online Article Text |
id | pubmed-5115437 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2015 |
publisher | John Wiley and Sons Inc. |
record_format | MEDLINE/PubMed |
spelling | pubmed-51154372016-12-15 Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015) Jeong, Hyeon‐Ho Mark, Andrew G. Lee, Tung‐Chun Son, Kwanghyo Chen, Wenwen Alarcón‐Correa, Mariana Kim, Insook Schütz, Gisela Fischer, Peer Adv Sci (Weinh) Cover Picture A parallel nanolithographic patterning method is presented by P. Fischer and co‐workers in article number 1500016 that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch‐mask applications. Image by Alejandro Posada Boada. [Image: see text] John Wiley and Sons Inc. 2015-07-22 /pmc/articles/PMC5115437/ http://dx.doi.org/10.1002/advs.201570022 Text en © 2015 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim https://creativecommons.org/licenses/by-nc/4.0/This is an open access article under the terms of the Creative Commons Attribution‐NonCommercial (https://creativecommons.org/licenses/by-nc/4.0/) License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited and is not used for commercial purposes. |
spellingShingle | Cover Picture Jeong, Hyeon‐Ho Mark, Andrew G. Lee, Tung‐Chun Son, Kwanghyo Chen, Wenwen Alarcón‐Correa, Mariana Kim, Insook Schütz, Gisela Fischer, Peer Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015) |
title | Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015) |
title_full | Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015) |
title_fullStr | Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015) |
title_full_unstemmed | Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015) |
title_short | Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015) |
title_sort | nanolithography: selectable nanopattern arrays for nanolithographic imprint and etch‐mask applications (adv. sci. 7/2015) |
topic | Cover Picture |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5115437/ http://dx.doi.org/10.1002/advs.201570022 |
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