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Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)

A parallel nanolithographic patterning method is presented by P. Fischer and co‐workers in article number 1500016 that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic i...

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Autores principales: Jeong, Hyeon‐Ho, Mark, Andrew G., Lee, Tung‐Chun, Son, Kwanghyo, Chen, Wenwen, Alarcón‐Correa, Mariana, Kim, Insook, Schütz, Gisela, Fischer, Peer
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2015
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5115437/
http://dx.doi.org/10.1002/advs.201570022
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author Jeong, Hyeon‐Ho
Mark, Andrew G.
Lee, Tung‐Chun
Son, Kwanghyo
Chen, Wenwen
Alarcón‐Correa, Mariana
Kim, Insook
Schütz, Gisela
Fischer, Peer
author_facet Jeong, Hyeon‐Ho
Mark, Andrew G.
Lee, Tung‐Chun
Son, Kwanghyo
Chen, Wenwen
Alarcón‐Correa, Mariana
Kim, Insook
Schütz, Gisela
Fischer, Peer
author_sort Jeong, Hyeon‐Ho
collection PubMed
description A parallel nanolithographic patterning method is presented by P. Fischer and co‐workers in article number 1500016 that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch‐mask applications. Image by Alejandro Posada Boada. [Image: see text]
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spelling pubmed-51154372016-12-15 Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015) Jeong, Hyeon‐Ho Mark, Andrew G. Lee, Tung‐Chun Son, Kwanghyo Chen, Wenwen Alarcón‐Correa, Mariana Kim, Insook Schütz, Gisela Fischer, Peer Adv Sci (Weinh) Cover Picture A parallel nanolithographic patterning method is presented by P. Fischer and co‐workers in article number 1500016 that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch‐mask applications. Image by Alejandro Posada Boada. [Image: see text] John Wiley and Sons Inc. 2015-07-22 /pmc/articles/PMC5115437/ http://dx.doi.org/10.1002/advs.201570022 Text en © 2015 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim https://creativecommons.org/licenses/by-nc/4.0/This is an open access article under the terms of the Creative Commons Attribution‐NonCommercial (https://creativecommons.org/licenses/by-nc/4.0/) License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited and is not used for commercial purposes.
spellingShingle Cover Picture
Jeong, Hyeon‐Ho
Mark, Andrew G.
Lee, Tung‐Chun
Son, Kwanghyo
Chen, Wenwen
Alarcón‐Correa, Mariana
Kim, Insook
Schütz, Gisela
Fischer, Peer
Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)
title Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)
title_full Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)
title_fullStr Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)
title_full_unstemmed Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)
title_short Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)
title_sort nanolithography: selectable nanopattern arrays for nanolithographic imprint and etch‐mask applications (adv. sci. 7/2015)
topic Cover Picture
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5115437/
http://dx.doi.org/10.1002/advs.201570022
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