Intrinsic Defects and H Doping in WO(3)

WO(3) is widely used as industrial catalyst. Intrinsic and/or extrinsic defects can tune the electronic properties and extend applications to gas sensors and optoelectonics. However, H doping is a challenge to WO(3), the relevant mechanisms being hardly understood. In this context, we investigate in...

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Detalles Bibliográficos
Autores principales: Zhu, Jiajie, Vasilopoulou, Maria, Davazoglou, Dimitris, Kennou, Stella, Chroneos, Alexander, Schwingenschlögl, Udo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5241671/
https://www.ncbi.nlm.nih.gov/pubmed/28098210
http://dx.doi.org/10.1038/srep40882

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5241671/
https://www.ncbi.nlm.nih.gov/pubmed/28098210
http://dx.doi.org/10.1038/srep40882

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