Parameter Space of Atomic Layer Deposition of Ultrathin Oxides on Graphene

[Image: see text] Atomic layer deposition (ALD) of ultrathin aluminum oxide (AlO(x)) films was systematically studied on supported chemical vapor deposition (CVD) graphene. We show that by extending the precursor residence time, using either a multiple-pulse sequence or a soaking period, ultrathin c...

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Detalles Bibliográficos
Autores principales: Aria, Adrianus I., Nakanishi, Kenichi, Xiao, Long, Braeuninger-Weimer, Philipp, Sagade, Abhay A., Alexander-Webber, Jack A., Hofmann, Stephan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2016
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5257172/
https://www.ncbi.nlm.nih.gov/pubmed/27723305
http://dx.doi.org/10.1021/acsami.6b09596

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5257172/
https://www.ncbi.nlm.nih.gov/pubmed/27723305
http://dx.doi.org/10.1021/acsami.6b09596

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