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Nanoimprint lithography for nanodevice fabrication
Nanoimprint lithography (NIL) is a compelling technique for low cost nanoscale device fabrication. The precise and repeatable replication of nanoscale patterns from a single high resolution patterning step makes the NIL technique much more versatile than other expensive techniques such as e-beam or...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Korea Nano Technology Research Society
2016
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5271567/ https://www.ncbi.nlm.nih.gov/pubmed/28191431 http://dx.doi.org/10.1186/s40580-016-0081-y |