Silicon Nanostructures Produced by Modified MacEtch Method for Antireflective Si Surface

This work pertains to the method for modification of silicon (Si) wafer morphology by metal-assisted chemical etching (MacEtch) technique suitable for fabrication of antireflective Si surfaces. For this purpose, we made different Au catalyst patterns on the surface of Si substrate. This modification...

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Detalles Bibliográficos
Autores principales: Nichkalo, Stepan, Druzhinin, Anatoly, Evtukh, Anatoliy, Bratus’, Oleg, Steblova, Olga
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2017
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5307424/
https://www.ncbi.nlm.nih.gov/pubmed/28209027
http://dx.doi.org/10.1186/s11671-017-1886-2

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5307424/
https://www.ncbi.nlm.nih.gov/pubmed/28209027
http://dx.doi.org/10.1186/s11671-017-1886-2

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