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Gate-tunable electron interaction in high-κ dielectric films

The two-dimensional (2D) logarithmic character of Coulomb interaction between charges and the resulting logarithmic confinement is a remarkable inherent property of high dielectric constant (high-κ) thin films with far reaching implications. Most and foremost, this is the charge Berezinskii-Kosterli...

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Autores principales: Kondovych, Svitlana, Luk’yanchuk, Igor, Baturina, Tatyana I., Vinokur, Valerii M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5316972/
https://www.ncbi.nlm.nih.gov/pubmed/28218245
http://dx.doi.org/10.1038/srep42770
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author Kondovych, Svitlana
Luk’yanchuk, Igor
Baturina, Tatyana I.
Vinokur, Valerii M.
author_facet Kondovych, Svitlana
Luk’yanchuk, Igor
Baturina, Tatyana I.
Vinokur, Valerii M.
author_sort Kondovych, Svitlana
collection PubMed
description The two-dimensional (2D) logarithmic character of Coulomb interaction between charges and the resulting logarithmic confinement is a remarkable inherent property of high dielectric constant (high-κ) thin films with far reaching implications. Most and foremost, this is the charge Berezinskii-Kosterlitz-Thouless transition with the notable manifestation, low-temperature superinsulating topological phase. Here we show that the range of the confinement can be tuned by the external gate electrode and unravel a variety of electrostatic interactions in high-k films. We find that by reducing the distance from the gate to the film, we decrease the spatial range of the 2D long-range logarithmic interaction, changing it to predominantly dipolar or even to exponential one at lateral distances exceeding the dimension of the film-gate separation. Our findings offer a unique laboratory for the in-depth study of topological phase transitions and related phenomena that range from criticality of quantum metal- and superconductor-insulator transitions to the effects of charge-trapping and Coulomb scalability in memory nanodevices.
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spelling pubmed-53169722017-02-24 Gate-tunable electron interaction in high-κ dielectric films Kondovych, Svitlana Luk’yanchuk, Igor Baturina, Tatyana I. Vinokur, Valerii M. Sci Rep Article The two-dimensional (2D) logarithmic character of Coulomb interaction between charges and the resulting logarithmic confinement is a remarkable inherent property of high dielectric constant (high-κ) thin films with far reaching implications. Most and foremost, this is the charge Berezinskii-Kosterlitz-Thouless transition with the notable manifestation, low-temperature superinsulating topological phase. Here we show that the range of the confinement can be tuned by the external gate electrode and unravel a variety of electrostatic interactions in high-k films. We find that by reducing the distance from the gate to the film, we decrease the spatial range of the 2D long-range logarithmic interaction, changing it to predominantly dipolar or even to exponential one at lateral distances exceeding the dimension of the film-gate separation. Our findings offer a unique laboratory for the in-depth study of topological phase transitions and related phenomena that range from criticality of quantum metal- and superconductor-insulator transitions to the effects of charge-trapping and Coulomb scalability in memory nanodevices. Nature Publishing Group 2017-02-20 /pmc/articles/PMC5316972/ /pubmed/28218245 http://dx.doi.org/10.1038/srep42770 Text en Copyright © 2017, The Author(s) http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
spellingShingle Article
Kondovych, Svitlana
Luk’yanchuk, Igor
Baturina, Tatyana I.
Vinokur, Valerii M.
Gate-tunable electron interaction in high-κ dielectric films
title Gate-tunable electron interaction in high-κ dielectric films
title_full Gate-tunable electron interaction in high-κ dielectric films
title_fullStr Gate-tunable electron interaction in high-κ dielectric films
title_full_unstemmed Gate-tunable electron interaction in high-κ dielectric films
title_short Gate-tunable electron interaction in high-κ dielectric films
title_sort gate-tunable electron interaction in high-κ dielectric films
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5316972/
https://www.ncbi.nlm.nih.gov/pubmed/28218245
http://dx.doi.org/10.1038/srep42770
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