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Internal stress induced natural self-chemisorption of ZnO nanostructured films

The energetic particles bombardment can produce large internal stress in the zinc oxide (ZnO) thin film, and it can be used to intentionally modify the surface characteristics of ZnO films. In this article, we observed that the internal stress increased from −1.62 GPa to −0.33 GPa, and the naturally...

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Autores principales: Chi, Po-Wei, Su, Chih-Wei, Wei, Da-Hua
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5324092/
https://www.ncbi.nlm.nih.gov/pubmed/28233827
http://dx.doi.org/10.1038/srep43281
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author Chi, Po-Wei
Su, Chih-Wei
Wei, Da-Hua
author_facet Chi, Po-Wei
Su, Chih-Wei
Wei, Da-Hua
author_sort Chi, Po-Wei
collection PubMed
description The energetic particles bombardment can produce large internal stress in the zinc oxide (ZnO) thin film, and it can be used to intentionally modify the surface characteristics of ZnO films. In this article, we observed that the internal stress increased from −1.62 GPa to −0.33 GPa, and the naturally wettability of the textured ZnO nanostructured films changed from hydrophobicity to hydrophilicity. According to analysis of surface chemical states, the naturally controllable wetting behavior can be attributed to hydrocarbon adsorbates on the nanostructured film surface, which is caused by tunable internal stress. On the other hand, the interfacial water molecules near the surface of ZnO nanostructured films have been identified as hydrophobic hydrogen structure by Fourier transform infrared/attenuated total reflection. Moreover, a remarkable near-band-edge emission peak shifting also can be observed in PL spectra due to the transition of internal stress state. Furthermore, our present ZnO nanostructured films also exhibited excellent transparency over 80% with a wise surface wetting switched from hydrophobic to hydrophilic states after exposing in ultraviolet (UV) surroundings. Our work demonstrated that the internal stress of the thin film not only induced natural wettability transition of ZnO nanostructured films, but also in turn affected the surface properties such as surface chemisorption.
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spelling pubmed-53240922017-03-01 Internal stress induced natural self-chemisorption of ZnO nanostructured films Chi, Po-Wei Su, Chih-Wei Wei, Da-Hua Sci Rep Article The energetic particles bombardment can produce large internal stress in the zinc oxide (ZnO) thin film, and it can be used to intentionally modify the surface characteristics of ZnO films. In this article, we observed that the internal stress increased from −1.62 GPa to −0.33 GPa, and the naturally wettability of the textured ZnO nanostructured films changed from hydrophobicity to hydrophilicity. According to analysis of surface chemical states, the naturally controllable wetting behavior can be attributed to hydrocarbon adsorbates on the nanostructured film surface, which is caused by tunable internal stress. On the other hand, the interfacial water molecules near the surface of ZnO nanostructured films have been identified as hydrophobic hydrogen structure by Fourier transform infrared/attenuated total reflection. Moreover, a remarkable near-band-edge emission peak shifting also can be observed in PL spectra due to the transition of internal stress state. Furthermore, our present ZnO nanostructured films also exhibited excellent transparency over 80% with a wise surface wetting switched from hydrophobic to hydrophilic states after exposing in ultraviolet (UV) surroundings. Our work demonstrated that the internal stress of the thin film not only induced natural wettability transition of ZnO nanostructured films, but also in turn affected the surface properties such as surface chemisorption. Nature Publishing Group 2017-02-24 /pmc/articles/PMC5324092/ /pubmed/28233827 http://dx.doi.org/10.1038/srep43281 Text en Copyright © 2017, The Author(s) http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
spellingShingle Article
Chi, Po-Wei
Su, Chih-Wei
Wei, Da-Hua
Internal stress induced natural self-chemisorption of ZnO nanostructured films
title Internal stress induced natural self-chemisorption of ZnO nanostructured films
title_full Internal stress induced natural self-chemisorption of ZnO nanostructured films
title_fullStr Internal stress induced natural self-chemisorption of ZnO nanostructured films
title_full_unstemmed Internal stress induced natural self-chemisorption of ZnO nanostructured films
title_short Internal stress induced natural self-chemisorption of ZnO nanostructured films
title_sort internal stress induced natural self-chemisorption of zno nanostructured films
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5324092/
https://www.ncbi.nlm.nih.gov/pubmed/28233827
http://dx.doi.org/10.1038/srep43281
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