Evolution analysis of EUV radiation from laser-produced tin plasmas based on a radiation hydrodynamics model

One of fundamental aims of extreme ultraviolet (EUV) lithography is to maximize brightness or conversion efficiency of laser energy to radiation at specific wavelengths from laser produced plasmas (LPPs) of specific elements for matching to available multilayer optical systems. Tin LPPs have been ch...

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Detalles Bibliográficos
Autores principales: Su, M. G., Min, Q., Cao, S. Q., Sun, D. X., Hayden, P., O’Sullivan, G., Dong, C. Z.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5362918/
https://www.ncbi.nlm.nih.gov/pubmed/28332621
http://dx.doi.org/10.1038/srep45212

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5362918/
https://www.ncbi.nlm.nih.gov/pubmed/28332621
http://dx.doi.org/10.1038/srep45212

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