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Tantalum nitride films integrated with transparent conductive oxide substrates via atomic layer deposition for photoelectrochemical water splitting

Tantalum nitride, Ta(3)N(5), is one of the most promising materials for solar energy driven water oxidation. One significant challenge of this material is the high temperature and long duration of ammonolysis previously required to synthesize it, which has so far prevented the use of transparent con...

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Detalles Bibliográficos
Autores principales:	Hajibabaei, Hamed, Zandi, Omid, Hamann, Thomas W.
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Royal Society of Chemistry 2016
Materias:	Chemistry
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5363780/ https://www.ncbi.nlm.nih.gov/pubmed/28451121 http://dx.doi.org/10.1039/c6sc02116f

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