The Study of Electrical Properties for Multilayer La(2)O(3)/Al(2)O(3) Dielectric Stacks and LaAlO(3) Dielectric Film Deposited by ALD

The capacitance and leakage current properties of multilayer La(2)O(3)/Al(2)O(3) dielectric stacks and LaAlO(3) dielectric film are investigated in this paper. A clear promotion of capacitance properties is observed for multilayer La(2)O(3)/Al(2)O(3) stacks after post-deposition annealing (PDA) at 8...

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Detalles Bibliográficos
Autores principales: Feng, Xing-Yao, Liu, Hong-Xia, Wang, Xing, Zhao, Lu, Fei, Chen-Xi, Liu, He-Lei
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2017
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5371537/
https://www.ncbi.nlm.nih.gov/pubmed/28359141
http://dx.doi.org/10.1186/s11671-017-2004-1

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5371537/
https://www.ncbi.nlm.nih.gov/pubmed/28359141
http://dx.doi.org/10.1186/s11671-017-2004-1

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