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Surface improvement of organic photoresists using a near-field-dependent etching method
Surface flattening techniques are extremely important for the development of future electrical and/or optical devices because carrier-scattering losses due to surface roughness severely limit the performance of nanoscale devices. To address the problem, we have developed a near-field etching techniq...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Beilstein-Institut
2017
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5389175/ https://www.ncbi.nlm.nih.gov/pubmed/28487821 http://dx.doi.org/10.3762/bjnano.8.81 |